Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for the manufacturing of the coating
First Claim
1. An anti-reflective layer system for substrates comprising:
- a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide;
a second layer arranged on said first layer, comprising nitride;
a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide;
a fourth layer arranged on said third layer, comprising nitride;
and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide;
wherein said second layer comprises nitrides selected from the group including TiNx, where x is equal to or greater than 1, and ZrN.
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Accused Products
Abstract
A coating, composed of an optically effective layer system for substrates, whereby the layer system has a high antireflective effect. On a front side of the substrate, facing the observer, in sequence from the front side to the observer, a first layer is arranged on the substrate, functioning as dielectric and comprising metal oxide. Thereupon follows a second layer comprising nitride, preferably TiNx (x is equal to or greater than 1, preferably x=1.05). A third layer follows functioning as dielectric and comprising metal oxide. Thereupon a fourth layer follows comprising nitride, preferably TiNx (x is equal to or greater than 1, preferably x=1.05). A fifth layer follows functioning as dielectric comprising metal oxide. On a backside of the substrate a TiNx -layer (x≧1, preferably x=1.05) is arranged. The adequate selection of certain materials for the individual layers, of certain layer thicknesses and of a certain sequence of the individual layers results in a surprisingly good antireflective coating, contrast increase and antistatic effect. These good optical features of the layer system are reached with a small number of layers and with thin layer thicknesses. This, in turn, leads to an extremely cost saving manufacturing of the coating.
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Citations
48 Claims
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1. An anti-reflective layer system for substrates comprising:
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a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide; a second layer arranged on said first layer, comprising nitride; a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide; a fourth layer arranged on said third layer, comprising nitride; and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide; wherein said second layer comprises nitrides selected from the group including TiNx, where x is equal to or greater than 1, and ZrN. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. An anti-reflective layer system for substrates comprising:
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a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide; a second layer arranged on said first layer, comprising nitride; a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide; a fourth layer arranged on said third layer, comprising nitride; and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide; wherein said third layer comprises oxides selected from the group including;
SnOx, x is equal to or less than 2, ZrO2, ZnO, Ta2 O5, Nicro-oxide, TiO2, Sb2 O3, In2 O3 and mixed oxides from oxides of this group. - View Dependent Claims (19, 20)
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21. An anti-reflective layer system for substrates comprising:
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a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide; a second layer arranged on said first layer, comprising nitride; a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide; a fourth layer arranged on said third layer, comprising nitride; and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide; wherein said fourth layer comprises nitrides selected from the group TiNx, where x is equal to or greater than 1, and ZrN. - View Dependent Claims (22, 23)
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24. An anti-reflective layer system for substrates comprising:
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a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide; a second layer arranged on said first layer, comprising nitride; a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide; a fourth layer arranged on said third layer, comprising nitride; and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide; wherein said fifth layer comprises MgF2.
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25. An anti-reflective layer system for substrates comprising:
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a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide; a second layer arranged on said first layer, comprising nitride; a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide; a fourth layer arranged on said third layer, comprising nitride; and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide; wherein said layer system further comprises an adhesive layer arranged between said first layer and said second layer. - View Dependent Claims (26, 27, 28)
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29. An anti-reflective layer system for substrates comprising:
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a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide; a second layer arranged on said first layer, comprising nitride; a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide; a fourth layer arranged on said third layer, comprising nitride; and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide; wherein said first layer comprises NiCr-suboxide functioning also as an adhesive.
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30. An anti-reflective layer system for substrates comprising:
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a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide; a second layer arranged on said first layer, comprising nitride; a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide; a fourth layer arranged on said third layer, comprising nitride; and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide; wherein said layer system is applied to a substrate composed of glass, and wherein said first layer has a thickness of 170 angstrom ±
20%;said second layer has a thickness of 170 angstrom ±
20%;said third layer has an optical thickness of 5550/4 angstrom ±
20%;said fourth layer has a thickness of 110 angstrom ±
20%;and said fifth layer has an optical thickness of 5550/4 angstrom ±
10%;such layer thicknesses selected with the cited thickness tolerances taking into account the interdependence between the layer thicknesses and materials selected for the layers.
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31. An anti-reflective layer system for substrates comprising:
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a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide; a second layer arranged on said first layer, comprising nitride; a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide; a fourth layer arranged on said third layer, comprising nitride; and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide; and further comprising a backside layer, applied to a back side of the substrate not facing the observer, said backside layer comprising TiNx, X is equal to or greater than 1. - View Dependent Claims (32, 33, 34, 35, 36)
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37. A method for manufacturing a coating for an optically effective layer system for substrates, the coating having an anti-reflective effect, comprising the following steps:
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on a side of the substrate which faces an observer, apply a first layer functioning as a dielectric and comprising metal oxide; apply a second layer covering said first layer comprising TiNx, where x is equal to or greater than 1; apply a third layer covering said second layer, functioning as a dielectric and comprising metal oxide; apply a fourth layer covering said third layer, comprising TiNx, where x is equal to or greater than 1; apply a fifth layer covering said fourth layer, functioning as a dielectric, and comprising metal oxide; wherein said layers are applied using a DC-reactive sputtering method from targets with a magnetron. - View Dependent Claims (38, 39)
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40. A method for manufacturing a coating for an optically effective layer system for substrates, the coating having an antireflective effect, comprising the following steps:
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on a side of the substrate which faces an observer, apply a first layer functioning as a dielectric and comprising metal oxide; apply a second layer covering said first layer comprising nitride; apply a third layer covering said second layer, functioning as a dielectric and comprising metal oxide; apply a fourth layer covering said third layer, comprising nitride; apply a fifth layer covering said fourth layer, functioning as a dielectric, and comprising metal oxide; wherein said layers are applied using a DC-reactive sputtering method from targets with a magnetron; wherein the substrate is composed of glass, and wherein at least one of said layers is generated composed of SnOx, x is equal to or less than 2, via reactive sputtering from a Sn target with said magnetron, in the presence of a sputtering gas mixture comprising Ar and O2, using a pressure of approximately 5×
10-3 mbar.
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41. A method for manufacturing a coating for an optically effective layer system for substrate, the coating having an antireflective effect, comprising the following steps:
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on a side of the substrate which faces an observer, apply a first layer functioning as a dielectric and comprising metal oxide; apply a second layer covering said first layer comprising nitride; apply a third layer covering said second layer, functioning as a dielectric and comprising metal oxide; apply a fourth layer covering said third layer, comprising nitride; apply a fifth layer covering said fourth layer, functioning as a dielectric, and comprising metal oxide; wherein said layers are applied using a DC-reactive sputtering method from targets with a magnetron; wherein the substrate is composed of glass, and wherein a layer is generated composed of SiO2, by reactive sputtering from an Si-target with said magnetron, in the presence of a sputtering gas mixture comprising Ar and O2, using a pressure of approximately 5×
10-3 mbar.
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42. A method for manufacturing a coating for an optically effective layer system for substrates, the coating having an antireflective effect, comprising the following steps:
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on a side of the substrate which faces an observer, apply a first layer functioning as a dielectric and comprising metal oxide; apply a second layer covering said first layer comprising nitride; apply a third layer covering said second layer, functioning as a dielectric and comprising metal oxide; apply a fourth layer covering said third layer, comprising nitride; apply a fifth layer covering said fourth layer, functioning as a dielectric, and comprising metal oxide; wherein said layers are applied using a DC-reactive sputtering method from targets with a magnetron; wherein the substrate is composed of glass, and wherein a layer is generated composed of Al2 O3, via reactive sputtering from an Al-target with said magnetron, in the presence of a sputtering gas mixture comprising Ar and O2, using a pressure of approximately 5×
10-3 mbar.
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43. A method for manufacturing a coating for an optically effective layer system for substrates, the coating having an antireflective effect, comprising the following steps:
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on a side of the substrate which faces an observer, apply a first layer functioning as a dielectric and comprising metal oxide; apply a second layer covering said first layer comprising nitride; apply a third layer covering said second layer, functioning as a dielectric and comprising metal oxide; apply a fourth layer covering said third layer, comprising nitride; apply a fifth layer covering said fourth layer, functioning as a dielectric, and comprising metal oxide; wherein said layers are applied using a DC-reactive sputtering method from targets with a magnetron; wherein the substrate is composed of glass, and wherein a layer is generated composed of TiNx, x is equal to or greater than 1, via reactive sputtering from a Ti-target with said magnetron, in the presence of a sputtering gas mixture comprising Ar and N2, using a pressure of approximately 5×
10-3 mbar.
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44. A method for manufacturing a coating for an optically effective layer system for substrates, the coating having an antireflective effect, comprising the following steps:
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on a side of the substrate which faces an observer, apply a first layer functioning as a dielectric and comprising metal oxide; apply a second layer covering said first layer comprising nitride; apply a third layer covering said second layer, functioning as a dielectric and comprising metal oxide; apply a fourth layer covering said third layer, comprising nitride; apply a fifth layer covering said fourth layer, functioning as a dielectric, and comprising metal oxide; wherein said layers are applied using a DC-reactive sputtering method from targets with a magnetron; wherein a plasma-supported chemical vapor deposition method is employed.
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45. A method for manufacturing a coating for an optically effective layer system for substrates, the coating having an antireflective effect, comprising the following steps:
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on a side of the substrate which faces an observer, apply a first layer functioning as a dielectric and comprising metal oxide; apply a second layer covering said first layer comprising nitride; apply a third layer covering said second layer, functioning as a dielectric and comprising metal oxide; apply a fourth layer covering said third layer, comprising nitride; apply a fifth layer covering said fourth layer, functioning as a dielectric, and comprising metal oxide; wherein said layers are applied using a DC-reactive sputtering method from targets with a magnetron; wherein a pyrolyse method is employed.
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46. An antireflective layer system for substrates comprising:
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a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide; a second layer arranged on said first layer, comprising nitride; a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide; a fourth layer arranged on said third layer, comprising nitride; and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide; wherein said first layer comprises oxides selected from the group including;
SnOx, x is equal to 2, ZrO2, ZnO, Ta2 O5, NiCr-oxide, TiO2 Sb2 O3, In2 O3, and mixed oxides from oxides of this group.
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47. An antireflective layer system for substrates comprising:
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a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide; a second layer arranged on said first layer, comprising nitride; a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide; a fourth layer arranged on said third layer, comprising nitride; and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide; wherein said fifth layer has a surface resistance, on a surface facing the observer, of 100 to 400 ohm per square. - View Dependent Claims (48)
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Specification