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Method of manufacturing phase-shifted diffraction grating

  • US 5,221,429 A
  • Filed: 02/07/1992
  • Issued: 06/22/1993
  • Est. Priority Date: 04/19/1990
  • Status: Expired due to Fees
First Claim
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1. A method of manufacturing a phase-shifted diffraction grating characterized by comprising the steps of:

  • coating a photoresist on a substrate;

    forming a phase shift medium on said photoresist;

    patterning said phase shift medium;

    radiating first and second laser beams having asymmetric incidence angles with respect to said substrate on said photoresist to perform an interference exposing operation;

    removing said phase shift medium;

    developing and post-baking said photoresist; and

    etching said substrate using said photoresist as a mask to form a diffraction grating having a discontinuous phase portion.

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