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Method of fabricating a thin film transistor having a silicon carbide buffer layer

  • US 5,221,631 A
  • Filed: 03/15/1991
  • Issued: 06/22/1993
  • Est. Priority Date: 02/17/1989
  • Status: Expired due to Fees
First Claim
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1. A method of forming a thin film transistor comprising the steps of:

  • forming a gate electrode on an insulating substrate, forming a first layer of insulating material over said gate electrode, forming a second layer of buffer material over said first layer, forming a third layer of semiconductor material over said second layer, forming a source electrode on said third layer, and forming a drain electrode spaced apart from said source electrode on said third layer, said step of forming a second layer includes the step of selecting a buffer material having a carrier density higher than the carrier density of said semiconductor material and the step of separating said second layer into two sections, each said section spaced apart from the other, one said section formed below said source electrode and the other said section formed below said drain electrode.

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