Antistatic resin composition

• US 5,223,553 A
• Filed: 11/27/1991
• Issued: 06/29/1993
• Est. Priority Date: 03/09/1983
• Status: Expired due to Term

• Current Assignee: Metallized Products Incorporated
• Original Assignee: Metallized Products Incorporated
• Inventors: Keough, Allen H.
• Primary Examiner(s): Ziegler, Jacob
• Application Number:
  US07/799,776
• Time in Patent Office: 580 Days
• Field of Search: 528/393, 528/75, 525/531, 525/528, 526/320, 526/266, 526/310, 522/71, 522/78, 522/100, 522/90
• US Class Current: 522/78
• CPC Class Codes: C08K 5/0075 Antistatics
• CPC Class Codes: C08K 5/19 Quaternary ammonium compounds
• CPC Class Codes: C08L 2666/36 Nitrogen-containing compounds
• CPC Class Codes: C09D 175/16 having terminal carbon-to-carbon unsaturated bonds
• CPC Class Codes: C09K 3/16 Anti-static materials
• CPC Class Codes: G03C 11/08 Varnishing, e.g. application of protective layers on finished photographic prints

Abstract

An antistatic resin composition which is the electron radiation cured reaction product of an electron radiation curable prepolymer and an electron radiation reactive antistatic agent soluble in the prepolymer. An antistatic laminate is made by applying a mixture of the prepolymer and antistatic agent to a substrate and then contacting the mixture with electron radiation.

Claims

1. An antistatic resin composition comprising the electron radiation cured reaction product of:

(A) an electron beam curable prepolymer; and

(B) an effective amount of a quaternary ammonium compound antistatic agent soluble in said prepolymer.

2. The antistatic resin composition of claim 1 wherein said quaternary ammonium compound is a trialkylalkyletherammonium salt.

3. The antistatic resin composition of claim 2 wherein each of said trialkyl groups has from 1 to about 3 carbon atoms and said alkylether group has an alkyl group having from about 4 to about 18 carbon atoms and said ether group is selected from the group consisting of ethylene oxide and propylene oxide.

4. The antistatic resin composition of claim 3 wherein said quaternary ammonium compound is triethylalkyletherammonium sulfate.

5. The antistatic resin composition of claim 1 wherein said prepolymer comprises an acrylated epoxy oligomer.

6. The antistatic resin composition of claim 1 wherein said prepolymer comprises an acrylated urethane oligomer.

7. The method of making an antistatic resin composition comprising the steps of:

(A) mixing an electron radiation curable prepolymer and an effective amount of an electron radiation reactive quaternary ammonium compound antistatic agent soluble in said prepolymer to form a solution thereof; and

(B) contacting said solution with electron radiation sufficient to cure said solution.

8. The method of making an antistatic resin composition of claim 7 wherein said quaternary ammonium compound is a trialkylalkyletherammonium salt.

9. The method of making an antistatic resin composition of claim 8 wherein each of said trialkyl groups has from 1 to about 3 carbon atoms and said alkylether group has an alkyl group having from about 4 to about 18 carbon atoms and said ether group is selected from the group consisting of ethylene oxide and propylene oxide.

10. The method of making an antistatic resin composition of claim 9 wherein said quaternary ammonium compound is triethylalkyletherammonium sulfate.

11. The method of making an antistatic resin composition of claim 7 wherein said prepolymer comprises an acrylated epoxy oligomer.

12. The method of making an antistatic resin composition of claim 7 wherein said prepolymer comprises an acrylated urethane oligomer.