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Airport runway cleaning method and apparatus

  • US 5,228,623 A
  • Filed: 01/03/1992
  • Issued: 07/20/1993
  • Est. Priority Date: 05/31/1989
  • Status: Expired due to Term
First Claim
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1. An apparatus to remove a first material from an underlying substrate surface of a substrate without significant damage to said substrate surface, where the substrate surface is characterized in that it is susceptible to damage by impingement of a high pressure water jet thereon, and said first material is characterized in that is it susceptible to removal from an underlying surface by impingement of a high pressure water jet therein, said apparatus comprising:

  • a. a housing structure adapted to move over said substrate;

    b. manifold arm means mounted to said structure in a manner to be positioned above said substrate, and to be rotatable about a generally vertical axis of rotation;

    c. water jet nozzle means mounted to said manifold arm means at a predetermined distance from said axis of rotation and arranged to discharge at least one water jet toward said substrate as said manifold arm means rotates about said axis of rotation;

    d. fluid pressure supply means adapted to supply water to said manifold arm means at a pressure greater than twenty thousand pounds per square inch for discharge through said water jet nozzle means; and

    e. power transmission means adapted to rotate said manifold arm means at a rotational rate of speed so that said water jet travels linearly in a generally circular path at a speed at least as great as twenty miles an hour.

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