Method for producing an optical waveguide array using a resist master

• US 5,230,990 A
• Filed: 12/23/1991
• Issued: 07/27/1993
• Est. Priority Date: 10/09/1990
• Status: Expired due to Term

• Current Assignee: Brother Kogyo Kabushiki Kaisha
• Original Assignee: Brother Kogyo Kabushiki Kaisha
• Inventors: Shinkai, Yuji, Yoshimura, Chisato, Iwasaki, Takeo, Inaishi, Kouji, Maruyama, Hideo
• Primary Examiner(s): Bowers, Jr., Charles L.
• Assistant Examiner(s): McPherson, John A.
• Application Number:
  US07/811,965
• Time in Patent Office: 582 Days
• Field of Search: 430/321, 430/330, 385/129, 385/130, 385/131, 385/132
• US Class Current: 430/321
• CPC Class Codes: G02B 3/0018 Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
• CPC Class Codes: G02B 3/0031 Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
• CPC Class Codes: G02B 3/005 arranged along a single direction only, e.g. lenticular sheets G02B3/0043 takes precedence
• CPC Class Codes: G02B 6/1221 made from organic materials
• CPC Class Codes: G02B 6/138 by using polymerisation
• CPC Class Codes: G03F 7/001 Phase modulating patterns, e.g. refractive index patterns

Abstract

The invention relates to an optical waveguide array producing method. The optical waveguide array producing method according to the invention uses an intermediate material forming process for forming an intermediate material of photoresist on a flat sheet, the intermediate material having projections formed in the shape of a predetermined pattern; a resist master forming process of forming a resist master by heating the intermediate material to thereby smooth the surfaces of the projections; an inverted mold forming process for forming an inverted mold having a surface shape that is the inverse of the resist master; a clad portion forming process, for forming a clad portion having grooves equal in sectional shape to the inverted mold, using the inverted mold and also using a first light-transmitting material of a low refractive index; a process for forming core portions by filling the grooves of the clad portion with a second light-transmitting material which is higher in refractive index than the first light-transmitting material; and a process of covering the core portions with a third light-transmitting material lower in refractive index than the first or the second light-transmitting material.

Claims

1. A method for manufacturing an optical waveguide array, comprising the steps of:

forming an intermediate material of photoresist on a flat sheet, the intermediate material comprising at least one projection formed in the shape of a predetermined pattern;

forming a resist master by heating the intermediate material to a temperature whereby the surfaces of the at least one projection are smoothed under the influence of surface tension;

forming an inverted mold having an inverted surface shape of said resist master;

forming a stamper by using said inverted mold, said stamper having a same surface shape as said resist master;

forming a first clad portion having at least one groove equal in sectional shape to said inverted mold using said stamper and also using a first light-transmitting material of a predetermined refractive index;

forming a core portion by filling the groove of said first clad portion with a second light-transmitting material which has a refractive index higher than that of the first light-transmitting material; and

forming a second clad portion on the core-side surface of said first clad portion with the first light-transmitting material or a third light-transmitting material which has a refractive index lower than that of the second light-transmitting material.

2. The manufacturing method for an optical waveguide array according to claim 1, wherein said first, second and third light-transmitting materials are ultraviolet light curing resins, each of said ultraviolet light curing resins having a predetermined refractive index.

3. The manufacturing method for an optical waveguide array according to claim 2, wherein said process for forming the intermediate material comprises the steps of:

forming a photoresist layer on said flat sheet;

exposing the photoresist layer by ultraviolet light above a photomask placed on the photoresistant material layer, said photomask having light shielding portions in conformity with waveguide patterns;

dissolving the photoresist which have been radiated by the ultraviolet light by a developer; and

washing away the photoresist which has been dissolved to form projections of the photoresist layer in conformity with waveguide patterns on said flat sheet.

4. The manufacturing method for an optical waveguide array according to claim 3, wherein said process for forming the resist master comprises the steps of:

heat-melting the projections of the photoresist layer in conformity with waveguide patterns on said flat sheet; and

smoothing the surface of the projections.

5. The manufacturing method for an optical waveguide array according to claim 4, wherein said process for forming the inverted mold comprises the steps of:

forming an electroconductive nickel film on the surface of said resist master having the protuberances;

forming a first nickel layer on said resist master incorporating the nickel film;

separating said flat sheet from said resist master with said first nickel layer formed thereon;

removing the protuberances remaining in the grooves of said first nickel layer.

6. The manufacturing method for an optical waveguide array according to claim 5, wherein said process for forming the stamper comprises the steps of:

forming a release film on the groove-side surface of said metal master;

forming a second nickel layer on the groove-side of said metal master with said release film formed thereon; and

separating said metal master from the combination of said metal master and said second nickel layer.

7. The manufacturing method for an optical waveguide array according to claim 6, wherein said process for forming he first clad portion comprises the steps of:

positioning a transparent sheet in parallel with but offset from said protuberance side of said stamper by a fine gap;

pouring the first ultraviolet light curing resin into the gap;

radiating a ultraviolet light to the first ultraviolet light curing resin from above said transparent sheet; and

separating said stamper from both said transparent sheet and the first ultraviolet light curing resin.

8. The manufacturing method for an optical waveguide array according to claim 7, wherein said process for forming the core portion comprises the steps of:

charging the second ultraviolet light curing resin into the groove by capillary action; and

radiating the ultraviolet light to the second ultraviolet light curing resin from above the groove.

9. The manufacturing method for an optical waveguide array according to claim 8, wherein said process for forming the second clad portion comprises the steps of:

positioning a transparent sheet in parallel with but offset from said core-side surface of said first clad portion by a fine gap;

pouring one of the group of resins consisting of the first ultraviolet light curing resin and the third ultraviolet light curing resin into the gap;

radiating a ultraviolet light onto the one of the group of resins consisting of the first ultraviolet light curing resin and the third ultraviolet light curing resin from above said transparent sheet.

10. The manufacturing method for an optical waveguide array according to claim 9, said manufacturing method for an optical waveguide array further comprising the step of shaping said optical waveguide array by a suitable means, said suitable means including cutting, grinding and polishing.

11. The manufacturing method for an optical waveguide array according to claim 1, wherein said process for forming the first clad portion, the core portion and the second clad portion are performed in an oxygen-free atmosphere.

12. The manufacturing method for an optical waveguide array according to claim 1, wherein said each projection is completely separated.

13. The manufacturing method for an optical waveguide array according to claim 1, wherein the section of the intermediate material changes from substantially rectangular shape to substantially semicircular shape by heating the intermediate material.

14. A method for manufacturing an optical waveguide array, comprising the steps of:

forming an intermediate material of photoresist on a flat sheet, the intermediate material comprising at least one projection formed in the shape of a predetermined pattern;

forming a resist master by heating the intermediate material to a temperature whereby the surfaces of the at least one projection are smoothed under the influence of surface tension; and

forming an optical waveguide array by using said resist master.

15. The manufacturing method for an optical waveguide array according to claim 14, wherein said each projection is completely separated.

16. The manufacturing method for an optical waveguide array according to claim 14, wherein the section of the intermediate material changes from substantially rectangular shape to substantially semicircular shape by heating the intermediate material.