Method of producing tungsten-titanium sputter targets and targets produced thereby
First Claim
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1. A method for preparing a tungsten-titanium sputter target having substantially no β
- (Ti, W) phase present and exhibiting improvement in reduction of particulate emission upon sputtering, comprising;
(a) providing powders of said tungsten and titanium wherein said titanium powder is present in an amount of about 1-20 wt. % based on the total weight of said tungsten and titanium powders provided;
(b) compacting said powders at a pressure of from about 200 to 1,000 MPa; and
(c) heating said powders at a temperature from about 600°
-882°
C.
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Abstract
Tungsten-titanium sputter targets of at least 95% theoretical density are provided with little or no β(Ti, W) phase constituent. Such targets will minimize troublesome particulate emissions during sputter coating conditions.
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Citations
18 Claims
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1. A method for preparing a tungsten-titanium sputter target having substantially no β
- (Ti, W) phase present and exhibiting improvement in reduction of particulate emission upon sputtering, comprising;
(a) providing powders of said tungsten and titanium wherein said titanium powder is present in an amount of about 1-20 wt. % based on the total weight of said tungsten and titanium powders provided; (b) compacting said powders at a pressure of from about 200 to 1,000 MPa; and (c) heating said powders at a temperature from about 600°
-882°
C. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 10, 12)
- (Ti, W) phase present and exhibiting improvement in reduction of particulate emission upon sputtering, comprising;
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9. A method for preparing a tungsten-titanium sputtering target having substantially no β
- (Ti, W) phase present and exhibiting improvement in reduction of particulate emission upon sputtering, comprising;
(a) providing powders of said tungsten and titanium with the amount of said titanium powder provided being on the order of about 1-20 wt. % based on the total weight of said tungsten and titanium; (b) compacting said powders at a pressure of from about 200-400 MPa for a time and temperature given within region 102 shown in FIG. 3, said region being bounded by curves 100 and 112 and lines 106 and 110 of said FIG. 3. - View Dependent Claims (11, 13)
- (Ti, W) phase present and exhibiting improvement in reduction of particulate emission upon sputtering, comprising;
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14. Sputter target comprising from about 1-20 wt. % titanium, and tungsten, said target characterized by having a density of at least about 95% of the theoretical density and having substantially zero β
- (T,W) phase present.
- View Dependent Claims (15, 16, 17)
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18. Sputter target comprising from about 1-20 wt. % titanium, and tungsten, said target having a density of about 95% of the theoretical density and having only trace amounts of β
- (Ti,W) phase present therein.
Specification