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Window for microwave plasma processing device

  • US 5,234,526 A
  • Filed: 05/24/1991
  • Issued: 08/10/1993
  • Est. Priority Date: 05/24/1991
  • Status: Expired due to Term
First Claim
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1. A microwave plasma processing device including a plasma generation chamber which generates plasma by exciting electron cyclotron resonance using microwaves introduced through a microwave lead-in opening in an end wall of the plasma formation chamber, the microwave lead-in opening having a cross section smaller than a cross section of the plasma formation chamber, the microwave plasma processing device including a microwave-penetrable substance on a side of the plasma generation chamber facing the microwave lead-in opening, the microwave-penetrable substance extending over an entire cross-section of the chamber, the microwave-penetrable substance having a thickness between a surface thereof facing an interior of the plasma generation chamber and another surface opposite thereto, the thickness becoming greater in a direction from a center of the plasma generation chamber to a periphery thereof.

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