Active carbon for deodorization and process for preparation thereof

• US 5,238,899 A
• Filed: 11/15/1991
• Issued: 08/24/1993
• Est. Priority Date: 11/16/1990
• Status: Expired due to Term

• Current Assignee: Nippondenso Co., Ltd. (DENSO Corporation), Nippon Soken, Inc. (DENSO Corporation)
• Original Assignee: Nippondenso Co., Ltd. (DENSO Corporation), Nippon Soken, Inc. (DENSO Corporation)
• Inventors: Suzuki, Makoto, Okamoto, Kunio, Kadowaki, Satoru, Kosaka, Atushi
• Primary Examiner(s): KONOPKA, PAUL
• Application Number:
  US07/792,261
• Time in Patent Office: 648 Days
• Field of Search: 502/413, 502/417, 502/437, 502/401, 502/158
• US Class Current: 502/401
• CPC Class Codes: A61L 9/01 Deodorant compositions compositions released by contact with a liquid A61L9/05
• CPC Class Codes: B01J 20/20 comprising free carbon; comprising carbon obtained by carbonising processes
• CPC Class Codes: B01J 20/28057 Surface area, e.g. B.E.T specific surface area
• CPC Class Codes: B01J 20/3204 Inorganic carriers, supports or substrates
• CPC Class Codes: B01J 20/3257 the functional group or the linking, spacer or anchoring group as a whole comprising at least one of the heteroatoms nitrogen, oxygen or sulfur together with at least one silicon atom, these atoms not being part of the carrier as such
• CPC Class Codes: B01J 20/3263 comprising a cyclic structure containing at least one of the heteroatoms nitrogen, oxygen or sulfur, e.g. an heterocyclic or heteroaromatic structure
• CPC Class Codes: D01F 11/123 Oxides
• CPC Class Codes: D01F 11/14 with organic compounds, e.g. macromolecular compounds

Abstract

Disclosed is an active carbon for deodorization, which comprises a deodorizing functional group fixed to a graphitic six-membered ring on the surface of the active carbon, through a silanol bond.

Claims

1. An active carbon for deodorization, which comprises a deodorizing functional group fixed to a graphitic six-membered ring on the surface of an active carbon through a silanol bond.

2. An active carbon for deodorization according to claim 1, wherein the deodorizing functional group is at least one member selected from the group consisting of amino groups and sulfone groups.

3. An active carbon for deodorization according to claim 2, wherein the deodorizing functional group is a primary amino group.

4. An active carbon for deodorization according to claim 1, wherein the group fixed to the graphitic six-member ring is a group of the formula:

##STR3## wherein X is a deodorizing functional group, and p is a positive integer.

5. An active carbon for deodorization according to claim 1, wherein the group fixed to the graphitic six-member ring is a group selected from the group consisting of:

##STR4## wherein Q represents a hydroxyl group or a monovalent oxygen direct bond, n is an integer of from 1 to 5, and m is integer of from 1 to 5, and ##STR5## where Q as defined above, and k is an integer of from 1 to 5.

6. An active carbon for deodorization according to claim 1, wherein the amount of the deodorizing functional group deposited is 5 to 100% by weight of the weight of the active carbon.

7. A process for the preparation of an active carbon for deodorization, which comprises steps of forming a hydroxyl group on graphitic active carbon on a surface of the active carbon by an oxidation treatment, and condensing said hydroxyl group formed on the surface of the active carbon with a silicon compound having a hydrolyzable group and a deodorizing functional group, to thereby fix the deodorizing functional group to the surface of the active carbon through a silanol bond.

8. A process according to claim 7, wherein the deodorizing functional group is a member selected from the group consisting of amino groups and sulfone groups.

9. A process according to claim 8, wherein the deodorizing functional group is a primary amino group.

10. A process according to claim 7, wherein the silicon compound is a compound of the formula:

##STR6## wherein X is a deodorizing functional group, p is a positive integer, and --OR is a hydrolizable group.

11. A process according to claim 7, wherein the silicon compound is a member selected from the group consisting of compounds represented by the following formula:

space="preserve" listing-type="equation">(RO).sub.l R'"'"'.sub.3-l Si(CH.sub.2).sub.n NH(CH.sub.2).sub.m NH.sub.2

wherein R independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R'"'"' independently represents an alkyl group having 1 to 5 carbon atoms, l is an integer of from 1 to 3, n is an integer of from 1 to 5, and m is an integer of from 1 to 5, and compounds represented by the following formula;

space="preserve" listing-type="equation">(RO).sub.l R'"'"'.sub.3-l Si(CH.sub.2).sub.k NH.sub.2

wherein R, R'"'"' and l are as defined above, and k is an integer of from 1 to 5.