Photosensitive member having fine cracks in surface protective layer

• US 5,242,773 A
• Filed: 11/07/1991
• Issued: 09/07/1993
• Est. Priority Date: 11/08/1990
• Status: Expired due to Term

• Current Assignee: Minolta Camera Kabushiki Kaisha
• Original Assignee: Minolta Camera Kabushiki Kaisha
• Inventors: Ojima, Seishi, Masaki, Kenji, Doi, Isao, Osawa, Izumi, Iino, Shuji
• Primary Examiner(s): MARTIN, ROLAND E
• Application Number:
  US07/788,931
• Time in Patent Office: 670 Days
• Field of Search: 430/66, 430/67, 430/58, 430/59
• US Class Current: 430/58.05
• CPC Class Codes: G03G 5/14704 comprising inorganic material

Abstract

The present invention relates to a photosensitive layer comprising:

a substrate;

a photosensitive layer formed on the substrate;

a surface protective layer formed on the photosensitive layer, the surface protective layer being a deposited layer formed by a vacuum vapor deposition method to have no less than 400/cm² solvent-penetrable spots formed in its thickness direction.

Claims

1. A photosensitive member comprising:

a substrate;

an organic photosensitive layer formed on the substrate; and

a continuous surface protective layer formed on the organic photosensitive layer, the surface protective layer being a deposited layer formed by a vacuum vapor deposition method to have no less than 400/cm² solvent-penetrable spots in its thickness direction.

2. A photosensitive member as claimed in claim 1, wherein a resin layer is further formed between the organic photosensitive layer and the surface protective layer and the surface protective layer is a deposited amorphous carbon layer formed by a plasma polymerization-vacuum vapor deposition method.

3. A photosensitive member as claimed in claim 1, wherein the surface of the organic photosensitive layer opposite to the interface in contact with the substrate is made irregular and the surface protective layer is 0.001 to 5 μ

m thick.

4. A photosensitive member as claimed in claim 3, wherein the maximum height (Rt) of the irregular surface is 0.05 to 0.4 μ

m and the mean mountain distance (Sm) is not longer than 30 μ

m.

5. A photosensitive member as claimed in claim 4, wherein the surface of the organic photosensitive layer opposite to the interface in contact with the substrate is made irregular by roughing by a mechanical abrasion method.

6. A photosensitive member as claimed in claim 4, wherein the surface of the organic photosensitive layer opposite to the interface in contact with the substrate is made irregular by roughing by a sand blasting method.

7. A photosensitive member as claimed in claim 1, wherein said organic photosensitive layer comprises:

an organic photosensitive monolayer comprising a charge transporting material and a charge generating material dispersed in a binder resin;

or an organic photosensitive bilayer comprising a charge transporting layer and a charge generating layer.