Anti-reflective transparent coating

• US 5,245,468 A
• Filed: 12/14/1990
• Issued: 09/14/1993
• Est. Priority Date: 12/14/1990
• Status: Expired due to Fees

• Current Assignee: Ford Motor Company
• Original Assignee: Ford Motor Company
• Inventors: Demiryont, Hulya, Surowiec, Roman
• Primary Examiner(s): Arnold, Bruce Y.
• Assistant Examiner(s): RYAN, JAY
• Application Number:
  US07/627,672
• Time in Patent Office: 1,005 Days
• Field of Search: 359/580, 359/586, 359/589, 359/359, 204/192.26, 204/192.27, 204/192.28, 428/428
• US Class Current: 359/359
• CPC Class Codes: B32B 17/10036 comprising two outer glass sheets
• CPC Class Codes: B32B 17/10174 Coatings of a metallic or dielectric material on a constituent layer of glass or polymer
• CPC Class Codes: B32B 17/10761 containing vinyl acetal
• CPC Class Codes: C03C 17/3482 comprising silicon, hydrogenated silicon or a silicide
• CPC Class Codes: G02B 1/115 Multilayers
• CPC Class Codes: Y10S 428/928 Magnetic property

Abstract

An anti-reflective coating employing Si_1-x H_x as a high refractive index material in a film pair together with SiO₂ as a low refractive index material is found to be substantially transparent to visible light and to provide good anti-reflectance where the Si_1-x H_x film is ultra-thin, preferably less than about 80 Angstroms, and the thickness of the SiO₂ film is matched to that of the Si_1-x H_x film. Laminated glazing units having such anti-reflective film can be used, for example, even in applications requiring high transmittance of visible light, such as motor vehicle windshields, in view of the substantial transparency of the coating.

Claims

1. An anti-reflective coating comprising an Si_1-x H_x film and a silicon dioxide film over the Si_1-x H_x film, x being a positive number less than 0.4, the anti-reflective coating having a transmittance of at least 50% to visible light.

2. The anti-reflective coating of claim 1 wherein the Si_1-x H_x film is less than about 80 Angstroms thick and the SiO₂ film is 1000 to 1700 Angstroms thick.

3. The anti-reflective coating of claim 1 wherein the Si_1-x H_x film has a thickness between 30 and 80 Angstroms, the SiO₂ film is directly on the Si_1-x H_x film and has a thickness between 1200 and 1600 Angstroms, and x is between 0.05 and 0.2.

4. An anti-reflective coating comprising an Si_1-x H_x film having a thickness of about 50 Angstroms and a SiO₂ film directly on the Si_1-x H_x film having a thickness of about 1400 Angstroms, x being about 0.11, the anti-reflective coating having at least 70% transmittance and less than 8% reflectance of visible light incident on the anti-reflective coating.

5. A glazing unit comprising a glazing substrate having a transmittance of at least 50% to visible light and an anti-reflective coating having a transmittance of at least 50% visible light on a surface of the glazing substrate, the anti-reflective coating comprising an Si_1-x H_x film and a SiO₂ film over the Si_1-x H_x film, x being a positive number less than 0.4.

6. The glazing unit of claim 5 wherein the anti-reflective coating is on a major exterior surface of the substrate, the Si_1-x H_x film is directly on the exterior surface and is less than 80 Angstroms thick, and the SiO₂ film is directly on the Si_1-x H_x film and is 1000 to 1700 Angstroms thick.

7. The glazing unit of claim 5 wherein the Si_1-x H_x film has a thickness between 30 and 80 Angstroms, the SiO₂ film is directly over the Si_1-x H_x film and has a thickness between 1200 and 1600 Angstroms, and x is between 0.05 and 0.2.

8. The glazing unit of claim 5 further comprising an anti-reflective film on a second surface of the substrate substantially opposite the first surface.

9. A glazing unit comprising a substrate and an anti-reflective coating on a surface of the substrate, the anti-reflective coating comprising an Si_1-x H_x film directly on the surface of the substrate and having a thickness of about 50 Angstroms, and a SiO₂ film directly on the Si_1-x H_x film having a thickness of about 1400 Angstroms, x being about 0.11, the glazing unit having at least about 70% transmittance and less than about 8% reflectance of visible light.

10. A laminated glazing unit comprising a first ply, a substantially inextensible substrate ply having a first surface laminated to the first ply by a laminating layer of flexible polymeric material, and an anti-reflective coating on a second surface of the substrate ply, the second surface being substantially parallel and coextensive with, and opposite to, the first surface, the anti-reflective coating comprising an Si_1-x H_x film directly on the surface of the substrate ply and a SiO₂ film directly over the Si_1-x H_x film, x being a positive number less than 0.4, the laminated glazing unit having a transmittance of at least 50% to visible light incident on the anti-reflective coating.

11. The laminated glazing unit of claim 10 wherein the first and substrate plys each is glass and the laminating ply is polyvinylbutyral.

12. The laminated glazing unit of claim 10 wherein the Si_1-x H_x film has a thickness between 30 and 80 Angstroms, x is between 0.05 and 0.2, the SiO₂ film has a thickness between 1200 and 1600 Angstroms and the glazing unit has above 70% transmittance and less than 8% reflectance of visible light incident on the anti-reflective coating.

13. The laminated glazing unit of claim 12 wherein the Si_1-x H_x film is about 50 Angstroms thick, x is about 0.11, and the SiO₂ film is about 1400 Angstroms thick.

14. A method of making a glazing unit with an anti-reflective coating said glazing unit having a transmittance of at least 50%, the method comprising depositing an Si_1-x H_x film on a surface of a substrate ply of the glazing unit and then depositing a SiO₂ film over the Si_1-x H_x film, wherein x is a positive number less than 0.45.

15. The method of claim 14 wherein said films are deposited by sputtering, the Si_1-x H_x film being between 30 and 80 Angstroms thick and the silicon dioxide film being between 1200 and 1600 Angstroms thick.

16. The method of claim 14 wherein the substrate ply of the glazing unit is a glass ply with a thin interfacial film of silicon directly on the surface thereof and the method further comprises heating the glass ply with the silicon film thereon to an elevated temperature for a period of time sufficient to alter its optical properties prior to depositing the Si_1-x H_x and SiO₂ films thereon.

17. The method of claim 16 wherein the glass ply is heated to at least 1000°

F.

18. The method of claim 16 wherein the elevated temperature is approximately the bending temperature of the glass ply and the period of time is about fifteen minutes.

19. A method of making a laminated glazing unit having a transmittance of at least 50%, comprising the steps of:

A) depositing a 30 to 80 Angstroms thick Si_1-x H_x film onto a major surface of a substantially inextensible substrate ply, wherein x is a positive number less than 0.40, by sputtering silicon in an atmosphere comprising hydrogen;

B) then depositing a 1200 to 1600 Angstrom thick SiO₂ film directly over the Si_1-x H_x film by sputtering silicon in an atmosphere comprising oxygen; and

C) then sandwiching a flexible polymeric laminating ply between the substrate ply and an additional ply and laminating the same, the major surface with the anti-reflective coating therein being an exterior surface of the glazing unit.