Process for preparing a lamination of organic monomolecular films, and a chemical adsorbent used for the process

• US 5,246,740 A
• Filed: 01/10/1991
• Issued: 09/21/1993
• Est. Priority Date: 01/12/1990
• Status: Expired due to Term

• Current Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Original Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Inventors: Ogawa, Kazufumi, Yamagata, Yoshikazu, Mino, Norihisa
• Primary Examiner(s): Beck, Shrive
• Assistant Examiner(s): DUDASH, DIANA L
• Application Number:
  US07/639,640
• Time in Patent Office: 985 Days
• Field of Search: 427/443.1, 427/337, 427/407.1, 427/2, 427/387, 556/431
• US Class Current: 427/437
• CPC Class Codes: B05D 1/185 applying monomolecular layers B05D1/204 takes precedence
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: C08G 77/00 Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
• CPC Class Codes: C09D 4/00 Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16

Abstract

According to the present invention, a lamination of organic monomolecular films is formed by a chemical adsorption technique. The representative example of the chemical adsorbent used in this invention is a hydrocarbon having trichlorosilyl group at one molecular end, and dialkylsilyl group at the other end. This chemical adsorbent binds to a base plate through silioxane linkage to form a first monomolecular film. It also binds to the first monomolecular film through siloxane linkage to form a second monomolecular film. As a result, a lamination of organic monomolecular films with desirable properties can be formed.

Claims

1. A process for preparing a lamination of organic monomolecular films comprising:

forming a first monomolecular film on a base plate by using a hydrocarbon having a group represented by the following formula I at one molecular end, and a group represented by the following formula II at the other end;

space="preserve" listing-type="equation">--Si--Cl.sub.n 1X.sup.1.sub.3-n 1 (I)

wherein X¹ is each independently, H, a lower alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a hydrocarbon group with unsaturated bonds having 2 to 30 carbon atoms, or a group represented by the following formula V, and n¹ is 1, 2 or 3,

space="preserve" listing-type="equation">X.sup.4.sub.3-n 4Y.sup.2.sub.n 4Si--(CH.sub.2)p.sup.1 --Z.sub.r 1--(CH.sub.2)q.sup.1 --Si-- (V)

wherein X⁴ is a lower alkyl group having 1 to 4 carbon atoms, Y² is, each independently, H, halogen, phenyl, --NR³₂, or --OR³, R³ is a lower alkyl group having 1 to 4 carbon atoms, Z_r 1 is a single bond or a group selected from the group consisting of;

##STR14## (R⁴ is a lower alkyl group having 1 to 4 carbon atoms), --C.tbd.C--C.tbd.C--, ##STR15## p¹ and q¹ are, each independently, zero or an integer, and p plus q is 1 to 30, and r¹ is an integer of zero to 5,

space="preserve" listing-type="equation">--Si--X.sup.2.sub.3-n 2Y.sup.1.sub.n 2 (II)

wherein X² is a lower alkyl group having 1 to 4 carbon atoms, Y¹ is, each independently, H, halogen, phenyl, --NR¹₂, or --OR¹, R¹ is a lower alkyl group having 1 to 4 carbon atoms, and n² is 1 or 2;

converting the group represented by formula II into an --OH group by oxidizing said first monomolecular film with hydrogen peroxide; and

forming a second monomolecular film on the surface of said oxidized first monomolecular film by using a hydrocarbon, wherein said hydrocarbon has a group represented by said formula I at one molecular end, and a group represented by said formula II at the other end.

2. A process of claim 1, wherein said group represented by formula II is at least one selected from the group consisting of --Si(CH₃)₂ H, --Si(CH₃)₂ F, --Si(CH₃)F₂, --Si(CH₃)₂ Cl, --Si(CH₃)Cl₂, --Si(CH₃)₂ NR¹₂, --Si(CH₃)₂ OR¹, --Si(CH₃)(OR¹)₂, and --Si(CH₃)₂ C₆ H₅.

3. A process of claim 1, wherein the step for forming said first monomolecular film is carried out by a chemical adsorption technique.

4. A process of claim 1, wherein the step for forming said second monomolecular film is carried out by a chemical adsorption technique.

5. A process of claim 1, wherein the surface of said base plate has hydroxyl groups, amino groups, or carboxyl group.

6. A process for preparing a lamination of organic monomolecular films comprising:

forming a first monomolecular film on a base plate by using a hydrocarbon having a group represented by the following formula I at one molecular end, and a group represented by the following formula III at the other end;

space="preserve" listing-type="equation">--Si--Cl.sub.n 1X.sup.1.sub.3-n 1 (I)

wherein X¹ is each independently, H, a lower alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a hydrocarbon group with unsaturated bonds having 2 to 30 carbon atoms, or a group represented by the following formula V, and n¹ is 1, 2 or 3,

space="preserve" listing-type="equation">X.sup.4.sub.3-n 4Y.sup.2.sub.n 4Si--(CH.sub.2)p.sup.1 --z.sub.r 1--(CH.sub.2)q.sup.1 --Si-- (V)

wherein X⁴ is a lower alkyl group having 1 to 4 carbon atoms, Y² is, each independently, H, halogen, phenyl, --NR³₂, or --OR³, R³ is a lower alkyl group having 1 to 4 carbon atoms, Z_r 1 is a single bond or a group selected from the group consisting of;

##STR16## (R⁴ is a lower alkyl group having 1 to 4 carbon atoms), --C.tbd.C--C.tbd.C--, ##STR17## p¹ and q¹ are, each independently, zero or an integer, and p plus q is 1 to 30, and r¹ is an integer of zero to 5,

space="preserve" listing-type="equation">--SiX.sup.3.sub.2 H (III)

wherein X³ is a lower alkyl group having 1 to 4 carbon atoms,

converting the H in the group represented by formula III into an --OH group by treating said first monomolecular film with an alkali; and

forming a second monomolecular film on the surface of said alkali-treated first monomolecular film by using a hydrocarbon, wherein said hydrocarbon has a group represented by said formula I at one molecular end, and a group represented by said formula III at the other end.

7. A process of claim 6, wherein the step for forming said first monomolecular film is carried out by a chemical adsorption technique.

8. A process of claim 6, wherein the step for forming said second monomolecular film is carried out by a chemical adsorption technique.

9. A process of claim 6, wherein the surface of said base plate has hydroxyl groups, amino groups, or carboxyl groups.

10. The process of claim 6 wherein said hydrocarbon is represented by the following formula VI:

space="preserve" listing-type="equation">HX.sup.3.sub.2 Si--(CH.sub.2).sub.p --Z.sub.r --(CH.sub.2).sub.q --SiCl.sub.n 1X.sup.1.sub.3-n 1 (VI)

wherein X¹ is each independently, H, a lower alkyl group having 1 to 4 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, Z_r is a single bond or a group selected from the group consisting of;

##STR18## (R² is a lower alkyl group having 1 to 4 carbon atoms), --C.tbd.C--C.tbd.C, ##STR19## X³ is a lower alkyl group having 1 to 4 carbon atoms, n¹ is 1, 2, or 3, p and q are, each independently, zero or an integer, and p plus q is 1 to 30, and r is an integer of zero to 5.