Micromechanical structure

• US 5,252,294 A
• Filed: 02/03/1992
• Issued: 10/12/1993
• Est. Priority Date: 06/01/1988
• Status: Expired due to Fees

• Current Assignee: Messerschmitt-Bolkow-Blohm GmbH
• Original Assignee: Messerschmitt-Bolkow-Blohm GmbH
• Inventors: Hilpert, Reinhold, Dette, Eduard, Seidel, Helmut, Binder, Florian, Deimel, Peter, Koniger, Max, Kroy, Walter
• Primary Examiner(s): NOT, DEFINED
• Assistant Examiner(s): Trembley, T. A.
• Application Number:
  US07/830,755
• Time in Patent Office: 617 Days
• Field of Search: 422/58, 422/102, 422/82.11, 422/68.1, 422/63, 437/901, 437/902, 437/921, 357/25, 357/55, 148/DIG. 12, 435/300, 435/287, 156/662, 156/663, 156/647
• US Class Current: 422/502
• CPC Class Codes: B01J 19/0093 Microreactors, e.g. miniaturised or microfabricated reactors laboratory containers with capillary fluid transport in microfabricated channels or chambers B01L3/5027
• CPC Class Codes: B01J 2219/00835 Comprising catalytically active material
• CPC Class Codes: B01L 2200/12 Specific details about manufacturing devices
• CPC Class Codes: B01L 2300/0627 Sensor or part of a sensor is integrated
• CPC Class Codes: B01L 2300/0645 Electrodes
• CPC Class Codes: B01L 2300/0654 Lenses; Optical fibres
• CPC Class Codes: B01L 2300/0816 Cards, e.g. flat sample carriers usually with flow in two horizontal directions
• CPC Class Codes: B01L 2300/0819 Microarrays; Biochips
• CPC Class Codes: B01L 2400/0633 with moving parts
• CPC Class Codes: B01L 3/5025 for parallel transport of multiple samples
• CPC Class Codes: B01L 3/5027 by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip B01L3/5023 takes precedence; micromixers B01F33/30; microreactors for synthesis B01J19/0093; microcapillary devices in general B81B1/00
• CPC Class Codes: B01L 3/50851 specially adapted for heating or cooling samples laboratory heating apparatus B01L7/00; incubators C12M
• CPC Class Codes: B01L 3/50853 with covers or lids
• CPC Class Codes: G01N 1/28 Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Qmounting specimens on microscopic slides G02B21/34; means for supporting the objects or the materials to be analysed in electron microscopes H01J37/20 ; laboratory gas handling apparatus B01L5/00
• CPC Class Codes: G01N 21/255 Details, e.g. use of specially adapted sources, lighting or optical systems
• CPC Class Codes: G01N 21/552 Attenuated total reflection
• CPC Class Codes: G01N 2201/0622 Use of a compensation LED
• CPC Class Codes: G01N 27/4145 specially adapted for biomolecules, e.g. gate electrode with immobilised receptors
• CPC Class Codes: G01N 35/00 Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
• CPC Class Codes: G01N 35/1079 with means for piercing stoppers or septums
• CPC Class Codes: H10N 39/00 : Integrated devices, or assemblies of multiple devices, comprising at least one piezoelectric, electrostrictive or magnetostrictive element covered by groups H10N30/00 – H10N35/00

Abstract

A micromechanical structure with cavities, containers, openings, canals, depressions, humps or the like for examinations of sample substances for possible changes of physical and/or chemical properties with targeted evaluation and documentation for the purposes of biotechnology, gene technology, cell and immune research and other medical, agricultural and environment research, where the structure consists of semiconducting material (of the group III to V of the elements of the periodic system) or contain the latter or glass or ceramic, diamond, or carbon and is made by a masking technique, especially by a chemical etching technique.

Claims

1. A micromechanical structure for investigation of sample substances in a targeted manner, comprising a masked-formed, etched structure with a plurality of depressions formed in an array that is made of at least one of a group of semiconductive materials, glass, ceramic, diamond, and carbon, the masked-formed, etched structure including a bottom structure, which has a plurality of depressions formed in an array, and a lid structure, which has a plurality of humps formed in an array, the lid and bottom structures being formed so the plurality of depressions and humps are at corresponding positions and have a same geometry, and so that when the lid structure is combined with the bottom structure, the plurality of corresponding depressions and humps are in alignment and form a plurality of microcontainments for containing one or more sample substances for evaluation and/or documentation of possible changes in one or more properties of the sample substances.

2. The micromechanical structure recited in claim 1, wherein the lid and bottom structures comprise the same material.

3. The micromechanical structure recited in claim 1, wherein the lid and bottom structures comprise silicon or another microcrystalline material or glass.

4. The micromechanical structure recited in claim 1, wherein the plurality of depressions are of defined form, size, arrangement, and distribution, and are in a surface of the bottom structure facing the lid structure.

5. The micromechanical structure recited in claim 4, wherein the lid structure fits hermetically tight on the bottom structure.

6. The micromechanical structure recited in claim 4, wherein the plurality of depressions are arranged in a predetermined spiral pattern.

7. The micromechanical structure recited in claim 4, wherein the lid structure has openings arranged in a same array as the depressions in the bottom structure, with the openings being capable of being closed, and wherein the lid structure further includes measuring and evaluating means for connection to computer means.

8. The micromechanical structure recited in claim 7, wherein the measuring and evaluating means are selected from the group consisting of optical, opto-electronic, electronic, piezoelectric, ferritic, magnetic, capacitive, ohmic or other measuring devices.

9. The micromechanical structure recited in claim 8, wherein the measuring and evaluating means are for individual measurements and evaluations of the individual contents of each of the plurality of depressions.

10. The micromechanical structure recited in claim 4, wherein a light waveguide distributes light into the plurality of depressions through the lid and bottom structures to evaluate changes in decoupled light by measuring transmitted intensity.

11. The micromechanical structure recited in claim 4, wherein the masked-formed, etched structure further comprises a detector for measuring external influences on the content of the individual depressions of the plurality of depressions.

12. The micromechanical structure recited in claim 1, wherein the arrangement of the plurality of depressions is provided in the array in matrix form, so that the matrix can be scanned by automatic filling or discharge and/or mixing and/or diluting/dosing means.

13. The micromechanical structure recited in claim 12, wherein the masked-formed, etched structure further comprises a plurality of microvalves which form a matrix which can be scanned in accordance with a predetermined program, the microvalves being arranged in the same array as the plurality of depressions.

14. The micromechanical structure recited in claim 1, wherein at least one depression of the plurality of depressions comprises a bio-sensor and/or biological-chemical sensor which includes a transistor containing a source and drain with a gate control.

15. The micromechanical structure recited in claim 1, wherein several of the masked-formed, etched structures are fixed onto a film carrier for transporting to a plurality of stations for automatic testing and evaluation.