Machining oxide thin-films with an atomic force microscope: pattern and object formation on the nanometer scale

• US 5,252,835 A
• Filed: 07/17/1992
• Issued: 10/12/1993
• Est. Priority Date: 07/17/1992
• Status: Expired due to Fees

• Current Assignee: Harvard University
• Original Assignee: Harvard University
• Inventors: Kim, Yun, Lieber, Charles M.
• Primary Examiner(s): Berman, Jack I.
• Application Number:
  US07/916,215
• Time in Patent Office: 452 Days
• Field of Search: 250/492.1, 250/492.2, 250/492.3
• US Class Current: 250/492.1
• CPC Class Codes: B82B 3/00 Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: G01Q 80/00 Applications, other than SPM, of scanning-probe techniques manufacture or treatment of nanostructures B82B3/00; recording or reproducing information using near-field interaction G11B9/12, G11B11/24, G11B13/08
• CPC Class Codes: G03F 1/68 Preparation processes not covered by groups G03F1/20 - G03F1/50
• CPC Class Codes: G03F 7/0043 Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof G03F7/0044 takes precedence
• CPC Class Codes: H01J 2237/31738 using STM
• CPC Class Codes: Y10S 977/856 including etching/cutting

Abstract

An atomic force microscope (AFM) has been used to machine complex patterns and to form free structural objects in thin layers of MoO₃ grown on the surface of MoS₂. The AFM tip can pattern lines with ≦10 nm resolution and then image the resulting structure without perturbation by controlling the applied load. Distinct MoO₃ structures can also be defined by AFM machining, and furthermore, these objects can be manipulated on the MoS₂ substrate surface using the AFM tip. These results suggest application to nanometer scale diffraction gratings, high-resolution lithography masks, and possibly the assembly of nanostructures with novel properties.

Claims

1. A method for machining oxide thin-films, comprising the steps of:

a) employing an atomic force microscope to pattern lines on the oxide thin film; and

b) imaging a resulting structure by controlling an applied load of a tip of the atomic force microscope.