Automatic tip approach method and apparatus for scanning probe microscope

• US 5,262,643 A
• Filed: 06/12/1992
• Issued: 11/16/1993
• Est. Priority Date: 06/12/1992
• Status: Expired due to Term

• Current Assignee: International Business Machines Corporation
• Original Assignee: International Business Machines Corporation
• Inventors: Martin, Yves, Roessler, Kenneth G., Hammond, James M., Klos, Martin A., Stowell, Robert M.
• Primary Examiner(s): Berman, Jack I.
• Application Number:
  US07/897,646
• Time in Patent Office: 522 Days
• Field of Search: 250/306, 250/307, 73/105
• US Class Current: 850/3
• CPC Class Codes: B82Y 35/00 Methods or apparatus for measurement or analysis of nanostructures
• CPC Class Codes: G01Q 10/02 Coarse scanning or positioning
• CPC Class Codes: Y10S 977/851 Particular movement or positioning of scanning tip

Abstract

A non-contact, step-wise method for automatically positioning a sensing probe, having a vibrating cantilever and tip, above a target surface utilizing acoustic and Van der Waals interactions respectively during an approach method. The sensing probe is lowered to a substantially optimized tip to target surface distance. The system utilizes the interaction of forces between the vibrating cantilever and target surface to automatically position the sensing probe above the target surface.

Claims

1. A non-contact method of positioning a sensing probe, having vibrating cantilever and tip, from a first position above a target surface comprising the steps of:

lowering said sensing probe to a second position above said target surface, said second position comprising a region where said sensing probe interacts acoustically with said target surface, and

further lowering said sensing probe to a third and final position above said target surface, said third position comprising a region where said sensing probe interacts atomically with said target surface.

2. The method as in claim 1, wherein:

said acoustical interaction comprises an air force gradient, and

said atomic interaction comprises a Van der Waals force.

3. The method as in claim 1, wherein:

said first position is determined by positioning said sensing probe by sensing an optical focal point between said sensing probe and said target surface;

the step of lowering said sensing probe to said second position further comprises sensing an acoustic coupling between said sensing probe and said target surface, and

the step of lowering said sensing probe to said third position further comprises sensing an atomic force interaction between said sensing probe and said target surface.

4. The method as in claim 3, wherein:

said first position is approximately 1 mm above said target surface;

said second position is approximately 1-10 microns above said target surface, and

said third position is approximately 10-100 Angstroms above said target surface.

5. The method as in claim 4, wherein:

said step of positioning said probe to said first position is at a rate of approximately 2 mm/sec;

said step of lowering said probe to said second position is at a rate of approximately 100 microns/sec, and

said step of lowering said probe to said third position is at a rate of approximately 10 microns/sec.

6. The method as in claim 5, wherein:

said acoustical interaction comprises an air force gradient, and

said atomic interaction comprises a Van der Waals force.

7. The method as in claim 1, wherein:

said acoustical interaction precipitates a dampened amplitude of vibration for said vibrating cantilever, and

said atomic interaction precipitates a further dampened amplitude of vibration for said vibrating cantilever.

8. The method as in claim 7, wherein:

said acoustical interaction with said target surface is monitored as a ratio of the amplitude of vibration of said dampened vibrating cantilever to the amplitude of vibration of said undampened vibrating cantilever, and

said atomic interaction with said target surface is monitored as a ratio of a change in the amplitude of vibration of said dampened vibrating cantilever with respect to a change of the distance of said tip to said target surface.

9. The method as in claim 8, wherein:

said acoustical interaction comprises an air force gradient, and

said atomic interaction comprises a Van der Waals force.

10. A non-contact method of automatically positioning a sensing probe, having a vibrating cantilever and tip, above a target surface comprising the steps of:

lowering said sensing probe to a first position above said target surface using optical focusing;

further lowering said sensing probe to a second position above said target surface, said second position comprising a region where said vibrating cantilever interacts acoustically with said target surface, and

further lowering said sensing probe to a third and final position above said target surface, said third position comprising a region where said tip interacts atomically with said target surface.

11. The method as in claim 10, wherein:

said acoustical interaction comprises an air force gradient, and

said atomic interaction comprises a Van der Waals force.

12. The method as in claim 10, wherein:

said optical focusing comprises sensing an optical focal point between said sensing probe and said target surface;

the step of lowering said sensing probe to said second position further comprises sensing an acoustic coupling between said sensing probe and said target surface, and

the step of lowering said sensing probe to said third position further comprises sensing an atomic force interaction between said sensing probe and said target surface.

13. The method as in claim 12, wherein:

said first position is approximately 1 mm above said target surface;

said second position is approximately 1-10 microns above said target surface, and

said third position is approximately 10-100 Angstroms above said target surface.

14. The method as in claim 13, wherein:

said step of positioning said probe to said first position is at a rate approximately 2 mm/sec;

said step of lowering said probe to said second position is at a rate of approximately 100 microns/sec, and

said step of lowering said probe to said third position is at a rate of approximately 10 microns/sec.

15. The method as in claim 14, wherein:

said acoustical interaction comprises an air force gradient, and

said atomic interaction comprises a Van der Waals force.

16. The method as in claim 10, wherein:

said acoustical interaction precipitates a dampened amplitude of vibration for said vibrating cantilever, and

said atomic interaction precipitates a further dampened amplitude of vibration for said vibrating cantilever.

17. The method as in claim 16, wherein:

said acoustical interaction with said target surface is monitored as a ratio of the amplitude of vibration of said dampened vibrating cantilever to the amplitude of vibration of said undampened vibrating cantilever, and

said atomic interaction with said target surface is monitored as a ratio of a change in the amplitude of vibration of said dampened vibrating cantilever with respect to a change of the distance of said tip to said target surface.

18. The method as in claim 17, wherein:

said acoustical interaction comprises an air force gradient, and

said atomic interaction comprises a Van der Waals force.

19. A non-contact method of automatically positioning a sensing probe, having a vibrating cantilever and tip, above a target surface comprising the steps of:

lowering said sensing probe to a first position above said target surface using optical focusing comprising sensing an optical focal point between said sensing probe and said target surface;

further lowering said sensing probe to a second position above said target surface, said second position comprising a region where said vibrating cantilever is acoustically coupled with said target surface, and

further lowering said sensing probe to a third and final position above said target surface, said third position comprising a region where Van der Waals forces effect the interaction of said tip with said target surface.

20. The method as in claim 19, wherein:

said first position is approximately 1 mm above said target surface;

said second position is approximately 1-10 microns above said target surface, and

said third position is approximately 10-100 Angstroms above said target surface.

21. The method as in claim 20, wherein:

said step of positioning said probe to said first position is at a rate of approximately 2 mm/sec;

said step of lowering said probe to said second position is at a rate of approximately 100 microns/sec, and

said step of lowering said probe to said third position is at a rate of approximately 10 microns/sec.

22. The method as in claim 19, wherein:

said acoustical interaction precipitates a dampened amplitude of vibration for said vibrating cantilever, and

said atomic interaction precipitates a further dampened amplitude of vibration for said vibrating cantilever.

23. The method as in claim 22, wherein:

said acoustical interaction with said target surface is monitored as a ratio of the amplitude of vibration of said dampened vibrating cantilever to the amplitude of vibration of said undampened vibrating cantilever, and

said atomic interaction with said target surface is monitored as a ratio of a change in the amplitude of vibration of said dampened vibrating cantilever with respect to a change of the distance of said tip to said target surface.

24. The method as in claim 23, wherein:

said first position is approximately 1 mm above said target surface;

said second position is approximately 1-10 microns above said target surface, and

said third position is approximately 10-100 Angstroms above said target surface.

25. A scanning probe microscope having a sensing probe mounted for non-contact vertical movement, for positioning the sensing probe above a target surface comprising:

a cantilever having a microminiature tip at one end, and a piezoelectric bimorph at the opposite end, said piezoelectric bimorph providing a means for vibrating said cantilever at a drive frequency, said cantilever carried by said sensing probe;

means for monitoring the amplitude of vibration of said vibrating cantilever, and

means, in response to said monitoring means, for automatically positioning said sensing probe.

26. The apparatus as in claim 25 wherein:

said drive frequency at which said cantilever is vibrated is a frequency greater than its resonant frequency.

27. A scanning probe microscope having a sensing probe, including a tip and vibrating cantilever, mounted for non-contact vertical movement, above a target surface, comprising:

means for monitoring the amplitude of vibration of said vibrating cantilever, and

means, responsive to said monitoring means, for automatically lowering said sensing probe in increasingly precise steps.

28. The apparatus as in claim 27, wherein said means for automatically lowering comprises:

lowering said probe to a first position at a rate of approximately 2 mm/sec;

lowering said probe to a second position at a rate of approximately 100 microns/sec, and

lowering said probe to a third position at a rate of approximately 10 microns/sec.

29. The apparatus as in claim 27, wherein said means for automatically lowering comprises:

an optical focusing means;

an acoustical interaction detection means, and

a Van der Waals force detection means.

30. The apparatus as in claim 27, wherein said means for automatically lowering comprises:

lowering said probe to a first position at a distance of approximately 1 mm above said target surface;

lowering said probe to a second position at a distance of approximately one to ten microns above said target surface, and

lowering said probe to a third position at a distance of approximately 30 Angstroms above said target surface.