Apparatus for vacuum deposition of sublimative substance

• US 5,272,298 A
• Filed: 12/31/1991
• Issued: 12/21/1993
• Est. Priority Date: 04/03/1991
• Status: Expired due to Term

• Current Assignee: Mitsubishi Jukogyo Kabushiki Kaisha
• Original Assignee: Mitsubishi Jukogyo Kabushiki Kaisha
• Inventors: Sueda, Minoru, Hoshi, Younosuke, Kamikawa, Susumu, Taguchi, Toshio
• Primary Examiner(s): Leung, Philip H.
• Application Number:
  US07/815,198
• Time in Patent Office: 721 Days
• Field of Search: 219/10.491, 219/10.67, 219/10.57, 219/10.79, 118/720, 118/723, 118/724, 118/725, 118/726, 118/728, 118/729, 118/50.1
• US Class Current: 219/634
• CPC Class Codes: C23C 14/243 Crucibles for source material C23C14/28, C23C14/30 take precedence

Abstract

A vacuum deposition apparatus has a slit-like nozzle formed in a receptacle accommodating a vacuum deposition material to effect uniform vacuum deposition of the material in the direction of width of a moving base material. The receptacle is made of graphite. An inductively heated body is disposed at the upper part of the receptacle and is provided with the small slit-like nozzle. The nozzle extends in the direction of width of the moving base material. The vaporized vacuum deposition material passes through the nozzle and is deposited uniformly in the direction of width of the moving base material.

Claims

1. A device for vaporizing a sublimative substance, said device comprising:

a receptacle having an open upper end;

an inductively heatable graphite body covering the open upper end of said receptacle, said graphite body having a slit extending through a central part thereof and open to the interior of said receptacle, said slit having a cross-sectional area smaller than that of the interior of said receptacle such that the central part of said graphite body forms a nozzle through which vapor produced from a sublimative substance accommodated in said receptacle will be ejected; and

an RF coil of an induction heater extending around said graphite body.

2. A device for vaporizing a sublimative substance as claimed in claim 1, wherein said receptacle has an inner surface of SiC.

3. A device for vaporizing a sublimative substance as claimed in claim 1, wherein said coil extends only around said graphite body of the device and is the only heating element of the device, and said graphite body has a bottom surface exposed to the interior of the receptacle at the upper end thereof such that heat emanating from said surface will produce the highest temperature in a sublimative substance accommodated in the receptacle at an uppermost surface of such substance.