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Valve closure mechanism for semiconductor deposition apparatus

  • US 5,275,303 A
  • Filed: 02/03/1992
  • Issued: 01/04/1994
  • Est. Priority Date: 02/03/1992
  • Status: Expired due to Fees
First Claim
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1. A means for closing an aperture formed through a wall comprising:

  • an aperture cover plate;

    at least one articulated linkage for moving the cover plate between an open position and an aperture closing position, each of said at least one linkage including at least a first member attached to the plate and a second member for pivotally mounting relative to the wall in which the aperture is formed, the members furthermore being pivotally attached with respect to each other to define an angle between them such that increasing the angle causes the plate to move between said aperture closing position and said open position whereby, when the cover plate is in the aperture closing position, said angle between the first and second members, is greater than one hundred and eighty degrees; and

    actuating means for driving said articulated linkage.

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