Manufacturing method of optical diffraction grating element with serrated gratings having uniformly etched grooves

• US 5,279,924 A
• Filed: 07/01/1992
• Issued: 01/18/1994
• Est. Priority Date: 04/04/1989
• Status: Expired due to Term

• Current Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Original Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Inventors: Sakai, Keiji, Miyake, Takahiro, Kubo, Katsuhiro, Yoshida, Yoshio, Kurata, Yukio
• Primary Examiner(s): McCamish, Marion E.
• Assistant Examiner(s): Chapman, Mark A.
• Application Number:
  US07/908,866
• Time in Patent Office: 566 Days
• Field of Search: 430/290, 430/299, 430/321, 350/162.17
• US Class Current: 430/290
• CPC Class Codes: G02B 5/1814 structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings G02B5/189 takes precedence
• CPC Class Codes: G02B 5/1857 using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
• CPC Class Codes: G02B 5/1871 Transmissive phase gratings
• CPC Class Codes: G11B 7/1353 Diffractive elements, e.g. holograms or gratings diffraction gratings per se G02B5/18; holograms per se G02B5/32; grating systems G02B27/44

Abstract

The method of manufacturing an optical diffraction grating element of the present invention is characterized in adopting an ion beam made from a gas chemically reacting with a glass substrate when forming a diffraction grating having a serrated profile upon the glass substrate through an ion beam etching method. Also, when manufacturing an optical diffraction grating element that is divided into a plurality of regions whereon diffraction gratings having different diffraction angles with respect to an incident light are provided, the method of the present invention is characterized in forming slits into a resist film disposed upon a transparent substrate such as a glass substrate, in accordance with the patterns of the diffraction gratings, such that the width of the slits is constant irrespectively of the regions. Accordingly, the method of manufacturing an optical diffraction grating element of the present invention enables to improve the diffraction efficiency of the optical diffraction grating element, and to enhance the optical efficiency of an optical head device. The SN ratio of the output signals released by the optical head device may be thus improved and the servo error control executed accurately.

Claims

1. A method of manufacturing an optical diffraction grating element comprising:

(a) forming a resist film upon a transparent substrate, wherein said resist film and substrate are divided into plurality of regions;

(b) exposing and developing each of said plurality of regions in said resist film for forming a plurality of diffraction grating patterns corresponding to each of said plurality of regions having slits free of resist film; and

(c) etching said resist film and said transparent substrate by irradiation of an ion beam upon a surface of said transparent substrate at a fixed angle, to form upon said transparent substrate a plurality of diffraction gratings having serrated profiles and mutually different diffraction angles with respect to an incident light,

wherein said slits formed during said exposing and developing process are designed such as to have a substantially constant width irrespectively of said plurality of diffraction grating patterns.

2. The method of manufacturing an optical diffraction grating element as defined in claim 1, further comprising

(d) the step of preparing a photomask provided with light transmitting parts and shadowing parts formed upon said substrate in accordance with said plurality of diffraction grating patterns such that a shadowing film is not disposed upon said substrate in said light transmitting parts, and said shadowing film is disposed upon said substrate in said shadowing parts;

wherein the widths of said light transmitting parts are substantially equal in width irrespectively of said diffraction grating patterns.

3. The method of claim 2, wherein the width of some of the shadowing parts on the photomasks are not of equal width and the exposing step uses said photomask;

the ion beam is directed to said substrate from one direction at an oblique angle; and

a gas used which comprises the ion beam is a fluoride gas that reacts with the substrate to form curves in the serrated portions.

4. The method of claim 3, wherein the gas is CF₄.

5. The method of claim 3, wherein the gas is CHF₃.

6. The method of claim 3, wherein the gas is C₂ F₆.

7. The method of claim 3, wherein the gas is NF₃.

8. The method of claim 1, wherein resist films remain between the slits after the development process the width of some of the resist films are greater than others a gas which comprises the ion beam is directed to said substrate from an oblique angle from only one direction and the gas is a fluoride gas effective to chemically react with said substrate to form curves in the serrated profiles.

9. The method of claim 1, wherein a gas which comprises the ion beam CF₄.

10. The method of claim 1, wherein a gas which comprises the ion beam is CHF₃.

11. The method of claim 1, wherein a gas which comprises the ion beam is C₂ F₆.

12. The method of claim 1, wherein a gas which comprises the ion beam is NF₃.