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Cluster tool soft etch module and ECR plasma generator therefor

  • US 5,280,219 A
  • Filed: 04/16/1993
  • Issued: 01/18/1994
  • Est. Priority Date: 05/21/1991
  • Status: Expired due to Term
First Claim
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1. A silicone wafer plasma processing apparatus comprising:

  • a sealed chamber containing a gas and having a wafer transferring port in a wall thereof communicating with a vacuum transfer chamber of a wafer transfer module of a wafer processing cluster tool, the port having a valve therein for sealing the sealed chamber from the transfer chamber;

    a high vacuum pump having an inlet communicating with the sealed chamber so as to produce a vacuum pressure level in the gas in the sealed chamber;

    a plasma generation cavity in the sealed chamber;

    a wafer holder to support the wafer with a side thereof facing the cavity;

    a source of microwave energy;

    means for coupling the microwave energy from the source into the cavity;

    a magnet assembly including a plurality of magnets positioned around the cavity, the magnets having a strength and configuration for producing a plurality of magnetic field portions each sufficient in strength to produce electron cyclotron resonance in the cavity to generate a plasma of the gas, the field portions defining regions at which the plasma the plasma is located within the cavity; and

    ,means for rotating the assembly, including the magnets, as a unit around the cavity to rotate the field portions, the regions and the plasma therewith within the cavity.

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