Apparatus and method for drying nail polish
First Claim
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1. An apparatus for the drying of nail polish comprising:
- a drying zone including enclosure means to enclose said drying zone, said enclosure means including a means defining an opening;
an air cooling means for cooling a flow of air;
an air directing means for directing said flow of cool air within said enclosed drying zone;
a hand or foot support plate; and
a heating means for said hand or foot support plate;
wherebya hand or foot having nail polish freshly applied to the nails thereof is placed on said support plate with the nails of the hand or foot inserted by said means defining an opening into said enclosure means, and thus into said drying zone, and said air directing means directs said flow of cool air into said drying zone while said heating means for said support plate maintains said support plate at a comfortable temperature, thus said flow of cool air within said drying zone speeds the drying of the applied layer of nail polish on the nails while said heating means for said support plate provides a comfortable environment.
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Abstract
An improved fingernail or toenail dryer that uses air cooled almost to freezing directed at nails that have been recently polished. The palm of the hand or sole of the foot thus being treated rests on a plate heated to a temperature sufficient to maintain comfort during the drying process. For hygienic improvement of the manicure or pedicure environment, the device also includes an integral roll of sanitary paper to allow for the easy dispensing of a portion of the paper over the heated plate and the cold air drying zone.
55 Citations
13 Claims
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1. An apparatus for the drying of nail polish comprising:
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a drying zone including enclosure means to enclose said drying zone, said enclosure means including a means defining an opening; an air cooling means for cooling a flow of air; an air directing means for directing said flow of cool air within said enclosed drying zone; a hand or foot support plate; and a heating means for said hand or foot support plate;
wherebya hand or foot having nail polish freshly applied to the nails thereof is placed on said support plate with the nails of the hand or foot inserted by said means defining an opening into said enclosure means, and thus into said drying zone, and said air directing means directs said flow of cool air into said drying zone while said heating means for said support plate maintains said support plate at a comfortable temperature, thus said flow of cool air within said drying zone speeds the drying of the applied layer of nail polish on the nails while said heating means for said support plate provides a comfortable environment. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of drying nail polish after the polish is applied to nails comprising the steps of:
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1) providing an enclosure having an opening adapted to receive fingernails or toenails, said enclosure thus providing a drying zone; 2) providing a means to cool air and to direct said cooled air through said drying zone; 3) providing a means to regulate said cooled air below 45°
Fahrenheit;
wherebyfingernails or toenails are inserted into said opening of said enclosure, thus being placed into said drying zone and said cooled air, said air being cooled below 45°
Fahrenheit is directed through said drying zone thus drying the applied polish at a substantially faster rate than would be accomplished otherwise. - View Dependent Claims (11, 12)
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13. A method of drying nail polish after the polish is applied to nails comprising the steps of:
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1) providing an enclosure having an opening adapted to receive fingernails or toenails, said enclosure thus providing a drying zone; 2) providing a means to cool air and to direct said cooled air through said drying zone; 3) providing a means to regulate said cooled air within the range of 32°
-34°
Fahrenheit;
wherebyfingernails or toenails are inserted into said opening of said enclosure, thus being placed into said drying zone and said cooled air, said air being cooled to between 32°
-34°
Fahrenheit is directed through said drying zone thus drying the applied polish at a substantially faster rate than would be accomplished otherwise.
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Specification
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Current AssigneeEstelle F. Edelman
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Original AssigneeEstelle F. Edelman
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InventorsEdelman, Estelle F.
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Primary Examiner(s)Bennett, Henry A.
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Application NumberUS07/993,106Time in Patent Office403 DaysField of Search34/202, 34/20, 34/13, 34/66US Class Current34/66CPC Class CodesA45D 29/18 Manicure or pedicure sets, ...A47K 10/48 Drying by means of hot air ...
