Supersonic molecular beam etching of surfaces

• US 5,286,331 A
• Filed: 11/01/1991
• Issued: 02/15/1994
• Est. Priority Date: 11/01/1991
• Status: Expired due to Fees

• Current Assignee: International Business Machines Corporation
• Original Assignee: International Business Machines Corporation
• Inventors: Chen, Lee, Natzle, Wesley C., Jeng, Shwu-Jen, Yu, Chienfan
• Primary Examiner(s): Hearn, Brian E.
• Assistant Examiner(s): GOUDREAU, GEORGE A
• Application Number:
  US07/786,448
• Time in Patent Office: 837 Days
• Field of Search: 156/643, 156/345, 118/723, 118/715
• US Class Current: 156/345.39
• CPC Class Codes: C23F 4/00 Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
• CPC Class Codes: H01L 21/31116 by dry-etching

Abstract

In supersonic molecular beam etching, the reactivity of the etchant gas and substrate surface is improved by creating etchant gas molecules with high internal energies through chemical reactions of precursor molecules, forming clusters of etchant gas molecules in a reaction chamber, expanding the etchant gas molecules and clusters of etchant gas molecules through a nozzle into a vacuum, and directing the molecules and clusters of molecules onto a substrate. Translational energy of the molecules and clusters of molecules can be improved by seeding with inert gas molecules. The process provides improved controllability, surface purity, etch selectivity and anisotropy. Etchant molecules may also be expanded directly (without reaction in a chamber) to produce clusters whose translational energy can be increased through expansion with a seeding gas.

Claims

1. An apparatus for etching a substrate, comprising:

an enclosure;

means for maintaining said enclosure at a subatmospheric pressure;

a nozzle assembly for generating a supersonic molecular beam from reactant molecules expanded through at least one nozzle in said nozzle assembly into said enclosure;

means for controlling an energy parameter of said supersonic molecular beam associated with said nozzle assembly; and

means for supporting a substrate in a path of said supersonic molecular beam, wherein a reaction if formed by an interaction between said reactant molecules devoid of external activation, a product of said reaction being reactive with said substrate.

2. An apparatus as recited in claim 1 wherein said means for controlling includes a chamber associated with said nozzle assembly including means for creating said reactant molecules at said nozzle assembly from precursor gases.

3. An apparatus as recited in claim 1 wherein said means for controlling comprises means for introducing a source of non-reactive molecules into said nozzle assembly and a nozzle in said nozzle assembly positioned for allowing said non-reactive molecules to be co-expanded through said nozzle with said reactant molecules.

4. An apparatus as recited in claim 1 wherein said nozzle assembly includes more than one nozzle.