Electrochemical production of higher pentafluorosulfonyl acid fluorides
First Claim
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1. A continuous process for preparing fluorochemical compounds, comprising the steps of:
- (1) charging a Simons electrochemical cell with anhydrous liquid hydrogen fluoride;
(2) periodically charging the cell with a S- and H-containing organic precursor to form a solution of anhydrous liquid hydrogen fluoride containing the precursor;
(3) electrolyzing the solution to produce a gaseous product mixture containing fluorochemical compounds having the formula F5 S--Rf --X where X is COF or SO2 F;
Rf is a saturated fluoroaliphatic radical having at least 3 fully-fluorinated C atoms; and
the Ff S group is bonded via a S--C bond to 1 of the 3 fully-fluorinated C atoms of the Rf radical.
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Abstract
A continuous process for preparing in a Simons electrochemical cell charged with anhydrous liquid HF and a S- and H-containing organic precursor fluorochemical compounds having the formula F5 S--Rf --X where X is COF or SO2 F; Rf is a saturated fluoroaliphatic radical having at least 3 fully-fluorinated C atoms; and the F5 S group is bonded via a S--C bond to 1 of the 3 fully-fluorinated C atoms of the Rf radical.
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3 Claims
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1. A continuous process for preparing fluorochemical compounds, comprising the steps of:
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(1) charging a Simons electrochemical cell with anhydrous liquid hydrogen fluoride; (2) periodically charging the cell with a S- and H-containing organic precursor to form a solution of anhydrous liquid hydrogen fluoride containing the precursor; (3) electrolyzing the solution to produce a gaseous product mixture containing fluorochemical compounds having the formula F5 S--Rf --X where X is COF or SO2 F;
Rf is a saturated fluoroaliphatic radical having at least 3 fully-fluorinated C atoms; and
the Ff S group is bonded via a S--C bond to 1 of the 3 fully-fluorinated C atoms of the Rf radical. - View Dependent Claims (3)
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2. The continuous process of claim 7, wherein:
- the precursor is selected from the group consisting of thiophenecarbonyl chloride, thiobutyrolactone, mercaptobenzoic acid, di-thiohexanoyl chloride, 3-methyl-2-thiophene carboxylic acid, 3-methyl-2-thiophene carboxylic acid, and 2-thiophenesulfonylfluoride.
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