Production of thin protective polyimide layers on high temperature superconductors

• US 5,288,697 A
• Filed: 05/06/1992
• Issued: 02/22/1994
• Est. Priority Date: 05/15/1991
• Status: Expired due to Fees

• Current Assignee: BASF AG (BASF SE)
• Original Assignee: BASF AG (BASF SE)
• Inventors: Haehnle, Hans-Joachim, Grunze, Michael, Schrepp, Wolfgang
• Primary Examiner(s): KING, ROY V
• Application Number:
  US07/879,012
• Time in Patent Office: 657 Days
• Field of Search: 505/1, 505/730, 505/701, 505/702, 427/62, 427/63, 427/407.1, 427/340, 427/385.5, 427/255.6, 427/430.1, 428/930
• US Class Current: 505/470
• CPC Class Codes: H10N 60/0716 Passivating
• CPC Class Codes: Y10S 505/701 Coated or thin film device, i.e. active or passive
• CPC Class Codes: Y10S 505/702 Josephson junction present

Abstract

Thin protective polyimide layers are produced on ceramic or high temperature superconductors by applying polyimide solutions, polyamic acids or starting substances therefor to the superconductor surface and imidating or drying in an oxygen atmosphere.

Claims

1. A process for producing a protective layer of a polyimide on a substrate of a high temperature superconductor material which comprises:

(1) applying a layer of a) a polyamic acid which serves as a precursor to polyimide or b) a precursor of the polyamic acid to the substrate and (2) imidating the applied layer in an atmosphere consisting essentially of oxygen.

2. The process of claim 1, wherein the polyamic acid is applied to the substrate by the Langmuir-Blodgett or Langmuir-Schafer technique.

3. The process of claim 1, wherein the precursor of the polyamic acid is applied to the substrate from the vapor phase.

4. A processing for producing a protective layer of a polyimide on a substrate of a high temperature superconductor material which comprises:

applying a solution of the polyimide to the substrate and drying the solution at an elevated temperature in an atmosphere consisting essentially of oxygen.

5. The process of claim 4, wherein the polyimide solution is applied to the substrate by spin-coating.