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Semiconductor pressure sensor

  • US 5,291,788 A
  • Filed: 09/24/1992
  • Issued: 03/08/1994
  • Est. Priority Date: 09/24/1991
  • Status: Expired due to Term
First Claim
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1. A semiconductor pressure sensor comprising:

  • a first semiconductor substrate made of a monocrystalline semiconductive material having a crystal axis, the first semiconductor substrate having first and second surfaces, a recessed portion being formed on the first surface;

    a second semiconductor substrate also made of a monocrystalline semiconductive material having a crystal axis, the second semiconductor substrate having first and second surfaces and being disposed around the first semiconductor substrate;

    a tubular seat having first and second end surfaces, the first end surface being connected to the first surface of the first semiconductor substrate, the first end surface being connected to the first surface of the first semiconductor substrate to surround the recessed portion, the tubular seat comprising a pressure guide path communicating the second end surface the recessed portion;

    at least a differential pressure sensor disposed on the second surface of the first semiconductor substrate for detecting differential pressure in a direction vertical to the crystal axis of the firs semiconductor substrate;

    at least a differential pressure sensor disposed on the second surface of the first semiconductor substrate for detecting differential pressure in a direction parallel with the crystal axis of the first semiconductor substrate;

    at least a static pressure sensor disposed on the second surface of the second semiconductor substrate for detecting static pressure in a direction vertical to the crystal axis of the second semiconductor substrate; and

    at least a static pressure sensor disposed on the second surface of the semiconductor substrate for detecting static pressure in a direction parallel with the crystal axis of the second semiconductor substrate.

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