Enhanced radiative zone-melting recrystallization method and apparatus
First Claim
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1. A method for preparing a SOI wafer having a monocrystalline semiconductor material film on a substrate comprising the steps of:
- supporting the wafer;
providing a first heater positioned over the wafer, the first heater being stationary relative to the wafer;
providing a second heater positioned below the wafer, the second heater being stationary relative to the wafer;
providing a third heater adapted for heating regions of the film to melt the regions by relative motion between the third heater and the wafer;
radiatively heating the film using the first heater and the second heater such that a relative thermal contribution of the first heater and the second heater produces a base temperature in the film below the melting point of the film;
heating contiguous regions of the film with radiant energy from the third heater to melt the regions of the film; and
solidifying the contiguous regions of the film to produce substantially monocrystalline semiconductor material.
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Abstract
A method is provided for zone-melting-recrystallization (ZMR) to produce high quality substantially subboundary-free silicon-on-insulator (SOI) thin films by controlled radiant heating of the silicon film. Using this technique, a much wider experimental parameter range which improves the uniformity of the crystalline quality over the entire SOI film is possible.
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Citations
10 Claims
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1. A method for preparing a SOI wafer having a monocrystalline semiconductor material film on a substrate comprising the steps of:
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supporting the wafer; providing a first heater positioned over the wafer, the first heater being stationary relative to the wafer; providing a second heater positioned below the wafer, the second heater being stationary relative to the wafer; providing a third heater adapted for heating regions of the film to melt the regions by relative motion between the third heater and the wafer; radiatively heating the film using the first heater and the second heater such that a relative thermal contribution of the first heater and the second heater produces a base temperature in the film below the melting point of the film; heating contiguous regions of the film with radiant energy from the third heater to melt the regions of the film; and solidifying the contiguous regions of the film to produce substantially monocrystalline semiconductor material. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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Specification