Laser machining

• US 5,296,673 A
• Filed: 01/14/1992
• Issued: 03/22/1994
• Est. Priority Date: 07/14/1989
• Status: Expired due to Term

• Current Assignee: Tyco Electronics UK Limited (TE Connectivity Limited)
• Original Assignee: Raychem Limited (TE Connectivity Limited)
• Inventors: Smith, Nicholas J. G.
• Primary Examiner(s): ALBRITTON, CLARENCE
• Application Number:
  US07/820,903
• Time in Patent Office: 798 Days
• Field of Search: 219/121.68, 219/121.69, 219/121.75
• US Class Current: 219/121.68
• CPC Class Codes: B23K 26/066 by using masks
• CPC Class Codes: B41M 5/24 Ablative recording, e.g. by burning marks; Spark recording marking by high energetic means, e.g. by laser otherwise than burning or ablative removal B41M5/26; materials or methods for recording or reproduction by optical means G11B7/00
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

Apparatus for excimer laser image protection ablation of a target material comprising a projection lens system for projecting a mask pattern to be ablated onto the target, which lens system is telecentric towards the image (target) end of the projection path, and means for moving the target along the projection path whereby in use the size of the projected image areas to be ablated from the target is adjusted substantially without altering their relative portions of the target.

Claims

1. Apparatus for ablation excimer laser image projection ablation of a target material and comprising a projection lens system for projecting along a projection path a mask pattern to be ablated onto the target, said lens system being telecentric towards the image (target) end of the projection path, and means for moving the target along projection path whereby in use the size of projected image areas to be ablated from the target is adjusted substantially without altering the relative positions of said image areas on the target.

2. Apparatus according to claim 1 wherein the lens system is telecentric only towards the said image end, and movement of the mask along the projection path between the light source and the lens system in use adjusts the size of the projected mask image as a whole.

3. An excimer laser image projection ablation apparatus having a projection lens system for projecting along a projection path a mask pattern to be ablated onto a target, a means for moving the target along the projection path whereby in use the size of projected image areas to be ablated from the target is adjusted substantially without altering the relative positions of said image areas on the target, and a support for the target which support is substantially non-absorptive and only diffusely reflective of the laser light falling thereon in use.

4. Apparatus according to claim 3 wherein the support comprises frosted quartz.

5. Apparatus according to claim 3, having an absorber for the light passing through the support, the absorber arranged to avoid unacceptable heating of the target.

6. Apparatus according to claim 4, having an absorber for the light passing through the support, the absorber arranged to avoid unacceptable heating of the target.