Electrode assembly useful in confined plasma assisted chemical etching

• US 5,298,103 A
• Filed: 07/15/1993
• Issued: 03/29/1994
• Est. Priority Date: 07/15/1993
• Status: Expired due to Fees

• Current Assignee: Integrated Process Equipment Corp. (Speedfam Co., Ltd)
• Original Assignee: Hughes Aircraft Company (Rtx Corporation)
• Inventors: Zarowin, Charles B., Steinberg, George N.
• Primary Examiner(s): POWELL, WILLIAM A
• Application Number:
  US08/093,120
• Time in Patent Office: 257 Days
• Field of Search: 156/345, 156/643, 156/646, 156/657, 156/662, 204/298.31, 204/298.33, 204/298.34, 118/723 E, 118/723 ER, 118/723 I, 219/121.4, 219/121.41
• US Class Current: 156/345.43
• CPC Class Codes: H01J 2237/3341 Reactive etching
• CPC Class Codes: H01J 37/32082 Radio frequency generated discharge H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence
• CPC Class Codes: H01J 37/32532 Electrodes
• CPC Class Codes: H01J 37/32623 Mechanical discharge control means

Abstract

An electrode assembly (10) for use in confined plasma assisted chemical etching includes an electrode (16) having a D.C. voltage source (46) connected thereto in addition to a source (60) of R. F. voltage such that ions formed during during plasma etching process are slowed or repelled from the electrode (16) as well as from a surrounding plasma confining member (18).

Claims

1. An electrode assembly useful in confined plasma assisted chemical etching;

comprises;

an electrode holder, said electrode holder having means for receiving an electrode;

means for laterally confining a plasma discharge established at said electrode; and

means for establishing a D.C. bias voltage on said electrode.

2. The assembly as claimed in claim 1, further comprising:

means for urging said means for laterally confining a plasma discharge against said electrode.

3. The assembly as claimed in claim 1 further commprising:

means for providing an R.F. voltage to said electrode.

4. The assembly as claimed in claim 1 wherein said electrode holder includes a flange, said flange being disposed distal said end.

5. The assembly as claimed in claim 1 wherein said means for establishing a D.C. bias voltage incudes a variable D.C. voltage source electrically connected to said electrode.

6. The assembly as claimed in claim 5 wherein said assembly further includes means for providing an R.F. voltage to said electrode.

7. The assembly as claimed in claim 6 wherein said means for establishing a D.C. bias voltage further includes means for electrically isolating said variable D.C. voltage source from said means for providing an R.F. voltage to said electrode.

8. The assembly as claimed in claim 3 further comprising means for matching the impedance of said means for providing an R.F. voltage to the inpedance of said electrode.

9. The assembly as claimed in claim 8 wherein said means for providing an R.F. voltage to said electrode includes means for electrically isolating said impedance matching means from said D.C. voltage source.

10. The assembly as claimed in claim 1, wherein said means for receiving an electrode is a cavity extending into said end of said electrode holder, said electrode being disposed in said cavity.

11. The assembly as claimed in claim 10 wherein said electrode extends from said cavity.

12. The assembly as claimed in claim 11 wherein said means for confining a plasma includes an opening therein, said opening having a comparatively larger diameter section proximate said electrode and a comparatively smaller diameter section distal said electrode whereby an electrode seat is established the interface of the sections of the opening.

13. The assembly as claimed in claim 12 wherein said electrode is a cylindrical disk having a diameter and the comparatively smaller diameter section has a diameter smaller than said diameter of said electrode.