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Electrode assembly useful in confined plasma assisted chemical etching

  • US 5,298,103 A
  • Filed: 07/15/1993
  • Issued: 03/29/1994
  • Est. Priority Date: 07/15/1993
  • Status: Expired due to Fees
First Claim
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1. An electrode assembly useful in confined plasma assisted chemical etching;

  • comprises;

    an electrode holder, said electrode holder having means for receiving an electrode;

    means for laterally confining a plasma discharge established at said electrode; and

    means for establishing a D.C. bias voltage on said electrode.

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