Ion-beam deposited multilayer waveguides and resonators

• US 5,303,319 A
• Filed: 12/28/1992
• Issued: 04/12/1994
• Est. Priority Date: 12/28/1992
• Status: Expired due to Term

• Current Assignee: University of Rochester
• Original Assignee: Honeywell Incorporated (Honeywell International Inc.)
• Inventors: Sullivan, Charles T., Ramberg, Randy J., Ford, Carol M., Podgorski, Theodore J.
• Primary Examiner(s): Lee, John D.
• Application Number:
  US07/997,994
• Time in Patent Office: 470 Days
• Field of Search: 385/129-132, 385/141, 359/359, 359/580, 359/586, 359/588
• US Class Current: 385/131
• CPC Class Codes: G02B 2006/12038 Glass (SiO2 based materials)
• CPC Class Codes: G02B 2006/12178 Epitaxial growth
• CPC Class Codes: G02B 6/12007 forming wavelength selective elements, e.g. multiplexer, demultiplexer
• CPC Class Codes: G02B 6/122 Basic optical elements, e.g. light-guiding paths
• CPC Class Codes: G02B 6/125 Bends, branchings or intersections
• CPC Class Codes: G02B 6/13 Integrated optical circuits characterised by the manufacturing method
• CPC Class Codes: G02B 6/132 by deposition of thin films

Abstract

An optical waveguide is formed by depositing multiple layers of thin films using the process of ion beam sputter deposition. The waveguide is made up of alternating layers of a first material and a second material wherein the two materials have differing indices of refraction and low optical loss. These materials are deposited upon a thermally stable substrate creating a multilayer stack which functions as a waveguide. The multilayer waveguide has ultra low propagation losses and good mode discrimination, thus being very efficient for use in single mode applications. The waveguide is easily adaptable to batch processing which reduces costs and increases the performance of the waveguide.

Claims

1. An optical waveguide for the transmission of light beams, comprising:

a substrate having a planar surface;

a multilayer stack having a plurality of alternating layers of a first material and a second material attached to the substrate, each layer of material having parallel planar surfaces in contact with the adjoining layers, a first layer attached to the planar surface of the substrate such that the planar surface of the first layer is in contact with the planar surface of the substrate, the first material having a low optical index of refraction and the second material having a high optical index of refraction, the first material and the second material both being attached to one another through the use of ion beam deposition; and

a topcoat of material attached to and covering a last layer of the multilayer stack, the topcoat made of a material with a low optical index of refraction, the topcoat being deposited onto the multilayer stack by ion beam deposition.

2. The optical waveguide of claim 1 wherein the substrate is constructed of Zerodur.

3. The optical waveguide of claim 1 wherein the first material is silicon dioxide (SiO₂).

4. The optical waveguide of claim 1 wherein the second material is zirconium dioxide (ZrO₂).

5. The optical waveguide of claim 1 further comprising a first isolation layer situated between the substrate and the multilayer stack wherein the first isolation layer is a material having a low optical index of refraction.

6. An optical waveguide for the transmission of light beams, comprising:

a substrate having a surface; and

a waveguide means attached to the substrate surface comprised of a stack of a first material having a first index of refraction and a second material having a second index of refraction, the first index of refraction being lower than the second index of refraction, the first and second materials being configured such that the waveguide means has an oscillating concentration of the first material and the second material when traversing the waveguide means in a direction normal to the substrate surface.

7. The optical waveguide of claim 6 wherein the substrate is made up of a material having an optical index of refraction no higher than the first index of refraction.

8. The optical waveguide of claim 7 further comprising a second isolation layer covering the waveguide means wherein the second isolation layer is made up of a material having an index of refraction lower than or equal to the first index of refraction.

9. The optical waveguide of claim 8 wherein the substrate and the second isolation layer are silicon dioxide.

10. The optical waveguide of claim 6 further comprising a first isolation layer situated between the substrate and the waveguide means wherein the first isolation layer is made up of a material having an index of refraction lower than or equal to the first index of refraction.

11. The optical waveguide of claim 10 further comprising a second isolation layer covering the waveguide means wherein the second isolation layer is made up of a material having an index of refraction lower than or equal to the first index of refraction.

12. The optical waveguide of claim 11 wherein the second isolation layer covers both the top and the sides of the waveguide means.

13. The optical waveguide of claim 11 wherein the first isolation layer and the second isolation layer are made up of silicon dioxide.

14. The optical waveguide of claim 10 wherein the substrate is made of Zerodur.

15. The optical waveguide of claim 6 wherein the waveguide means is a rectangular channel.

16. The optical waveguide of claim 6 wherein the first material is silicon dioxide (SiO₂).

17. The optical waveguide of claim 6 wherein the second material is zirconium dioxide (ZrO₂) doped with silicon dioxide (SiO₂).

18. The optical waveguide of claim 6 wherein the waveguide means is fabricated using the method of ion beam sputter deposition.

19. An optical waveguide for the transmission of optical signals, comprising:

a substrate having a surface;

a lower isolation means attached to the substrate surface for containing optical signals, the lower isolation means made up of a material having a low optical index of refraction;

a waveguide means attached to the lower isolation means comprised of a stack of a first material having a first index of refraction and a second material having a second index of refraction, the first index of refraction being lower than the second index of refraction and the first index of refraction being no lower than the index of refraction of the lower isolation means, the first and second materials being configured such that the waveguide means has an oscillating concentration of the first material and the second material when traversing the waveguide means in a direction normal to the substrate surface; and

an upper isolation means covering the waveguide means for containing optical signals, the upper isolation means made up of material having an optical index of refraction not higher than the first index of refraction.

20. The optical waveguide of claim 19 wherein the upper isolation means covers both the top and the sides of the waveguide means.

21. The optical waveguide of claim 19 wherein the substrate is made of Zerodur.

22. The optical waveguide of claim 19 wherein the first material is silicon dioxide (SiO₂).

23. The optical waveguide of claim 19 wherein the second material is zirconium dioxide (ZrO₂) doped with silicon dioxide (SiO₂).

24. The optical waveguide of claim 19 wherein the lower isolation means and the upper isolation means are made up of silicon dioxide.

25. The optical waveguide of claim 19 wherein the waveguide means is fabricated using the method of ion beam sputter deposition.

26. A process for the fabrication of an optical waveguide, comprising the steps of:

a. depositing an isolation layer upon a substrate wherein the substrate is constructed of a material having a low index of thermal expansion, the isolation layer comprised of a material having a first index of refraction;

b. depositing a first layer of material upon the isolation layer, the first layer of material being deposited by ion beam deposition, wherein the material of the first layer has a second optical index of refraction, the second index of refraction being greater than or equal to the first index of refraction;

c. depositing a second layer of material upon the first layer of material wherein the material of the second layer has a third optical index of refraction, the third index of refraction being greater than the second index of refraction, and the material of the second layer is deposited upon the first layer by ion beam deposition; and

d. depositing a topcoat upon the second layer of material wherein the topcoat is deposited upon the second layer by ion beam deposition, the topcoat comprised of a material having the first index of refraction.