Titanium-tungsten target material and manufacturing method thereof

• US 5,306,569 A
• Filed: 07/16/1992
• Issued: 04/26/1994
• Est. Priority Date: 06/15/1990
• Status: Expired due to Fees

• Current Assignee: Hitachi Metals (Thailand) Ltd.
• Original Assignee: Hitachi Metals (Thailand) Ltd.
• Inventors: Hiraki, Akitoshi
• Primary Examiner(s): Walsh, Donald P.
• Assistant Examiner(s): GREAVES, JOHN N
• Application Number:
  US07/914,544
• Time in Patent Office: 649 Days
• Field of Search: 29/182.8, 75/65 EB, 75/150, 75/214, 75/230, 75/238, 75/248, 156/664, 204/15, 204/192.32, 357/71, 361/321, 419/8, 428/664
• US Class Current: 428/569
• CPC Class Codes: C23C 14/3414 Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
• CPC Class Codes: H01J 37/3429 Plural materials
• CPC Class Codes: Y10T 428/12174 Mo or W containing

Abstract

A titanium-tungsten target material capable of limiting the amount of particles generated during sputtering and a method of manufacturing this titanium-tungsten material. The titanium-tungsten target material has a titanium-tungsten alloy phase which occupies 98% or more of the whole area of the material as observed in a micro-structure thereof. In one example of the manufacturing method, an ingot obtained by melting tungsten and titanium is processde by a solution treatment to form a titanium-tungsten target, or a power obtained by melting the ingot is sintered to form a target. Preferably, the melting may be performed under reduced pressure in an electron beam melting manner. In another example of the manufacturing method, a powder is formed from a molten metal by an atomization method and the obtained powder is sintered to form a titanium-tungsten target. For sintering of the powder, it is preferable to apply hot isostatic pressing or hot pressing.

Claims

1. A titanium-tungsten target material comprising a titanium-tungsten alloy phase which occupies 98% or more of a cross-sectional area of the titanium-tungsten target material.

8. A titanium-tungsten target material according to claim 1, consisting essentially of a titanium-tungsten alloy phase.

9. A titanium-tungsten target material according to claim 1, not containing an independent tungsten or titanium phase.

2. A method of manufacturing a titanium-tungsten target, comprising the steps of preparing an ingot formed by melting tungsten and titanium;

and

processing the ingot by a solution treatment.

4. A method of manufacturing a titanium-tungsten target according to claim 2 or 3, wherein tungsten and titanium are melted by an electron beam melting process under reduced pressure.

3. A method of manufacturing a titanium-tungsten target, comprising the steps of preparing an ingot formed by melting tungsten and titanium;

pulverizing the ingot into a powder; and

sintering the powder.

6. A method of manufacturing a titanium-tungsten target according to claim 3 or 5, wherein sintering is effected by hot isostatic pressing.

7. A method of manufacturing a titanium-tungsten target according to claim 3 or 5, wherein sintering is effected by hot pressing.

5. A method of manufacturing a titanium-tungsten target, comprising the steps of preparing a molten metal formed by melting tungsten and titanium;

forming a powder from the molten metal by an atomization method; and

sintering the powder.