Optical apparatus

• US 5,307,199 A
• Filed: 07/25/1991
• Issued: 04/26/1994
• Est. Priority Date: 07/27/1990
• Status: Expired due to Fees

• Current Assignee: Hamamatsu Photonics KK
• Original Assignee: Hamamatsu Photonics KK
• Inventors: Tsuchiya, Yutaka, Aoshima, Shinichiro, Urakami, Tsuneyuki
• Primary Examiner(s): Moskowitz, Nelson
• Application Number:
  US07/735,792
• Time in Patent Office: 1,006 Days
• Field of Search: 359/244, 359/299, 359/108, 359/94, 359/95, 359/285, 359/286, 385/5, 385/22
• US Class Current: 359/244
• CPC Class Codes: G02F 1/293 by another light beam, i.e. opto-optical deflection

Abstract

The optical apparatus includes first and second deflection members, a mask, a pumping light source, and a controller. The first and second deflection members are formed of nonlinear optical material whose refractive index is changed upon light radiation. The mask is arranged on an optical path extending from a front side of the first deflection member to a rear side of a second deflection member. The mask has a predetermined transmission pattern. The pumping light source radiates first and second beams on predetermined regions of the first and second deflection members. This changes the refractive indices of the predetermined regions to bend the optical path. The controller variably controls the intensity of the first and second beams.

Claims

1. An optical apparatus comprising:

a first deflection member formed of a nonlinear optical material having a refractive index which changes based on an intensity of a first control light beam incident thereon, the first deflection member having at least first, second and third sides, and the first side being adapted to receive an input light signal;

a second deflection member formed of a nonlinear optical material having a refractive index which changes based on an intensity of a second control light beam incident thereon, the second deflection member having at least first, second and third sides;

mask means, disposed in an information optical path from the third side of the first deflection member to the first side of second deflection member, for transmitting a predetermined pattern of light emitted from the third side of the first deflection member to the first side of the second deflection member;

first means for emitting the first control light beam on a first region of the first deflection member, the first control light beam being incident on the second side of the first deflection member;

second means for emitting the second control light beam on a second region of the second deflection member, the second control light beam being incident on the second side of the second deflection member, and said second region being defined by 180 degrees rotation of said first region around a predetermined axis, said predetermined axis being on a plane defined by a vector for a path of the input light signal and a vector for a direction of the first control light beam and going through a predetermined point between said first deflection member and said second deflection member; and

control means for controlling intensities of the first and second control light beams.

2. An optical waveshaping apparatus, comprising an optical apparatus of claim 1, for converting input light incident on the first side of the first deflection member into output light which is waveshaped in terms of an intensity, and generating the output light from the third side of said second deflection member.

3. An apparatus according to claim 2, wherein said mask means comprises spatial light modulator means for changing a pattern of light incident thereon according to a mask-writing signal.

4. An apparatus according to claim 2, wherein

the first deflection member, second deflection member and the mask means are linearly arranged so that an input light incident on the first side of the first deflection member and emerging as an output light from the third side of the second deflection member has a first optical path which is linear;

and

the first and second means include optical means for directing the first and second control light beams along second and third optical paths, respectively, from a pumping light source to the first and second deflection members in a direction perpendicular to the first optical path, and first and second limiter means arranged in the first and second optical paths, the first and second limiter means having openings for defining the first and second regions to be irradiated with the first and second control light beams.

5. An apparatus according to claim 4, wherein said first and second limiter means have triangular openings which define prism-like first and second regions having an axis extending in a direction perpendicular to the first optical path.

6. An apparatus according to claim 4, wherein a pattern of each of the openings of the first and second limitter means is variable.

7. An apparatus according to claim 4, wherein said optical means splits a single pumping light emerging from said pumping light source into the first and second control light beams, and sets the third optical path longer than the second optical path by an amount corresponding to a distance between said first and second deflection members.

8. An apparatus according to claim 2, wherein the first deflection member, second deflection member and the mask means are linearly arranged so that an input light incident on the first side of the first deflection member and emerging as an output light from the third side of the second deflection member has a first optical path which is linear;

and

the first and second means include a pumping light source for generating the first and second control light beams, optical means for directing the first and second control light beams along second and third optical paths, respectively, from said pumping light source to said first and second deflection members in a direction perpendicular to the first optical path, and first and second filter means, arranged in the first and second optical paths of the first and second control light beams, respectively, for spatially nonuniformly adjusting radiation intensities of the first and second control light beams to the first and second regions.

9. An apparatus according to claim 8, wherein the first and second filter means have a transparent region and the transparent region is variable.

10. An apparatus according to claim 8, wherein said optical means splits a single pumping light emerging from said pumping light source into the first and second control light beams, and sets the third optical path to be longer than the second optical path by an amount corresponding to a distance between said first and second deflection members.

11. An optical gate apparatus, comprising an optical apparatus of claim 1, for generating an output image corresponding to an input image incident on the first side of said first deflection member, from the third side of said second deflection member.

12. An apparatus according to claim 11, wherein said mask means has a slit.

13. An apparatus according to claim 12, wherein a width of the slit is variable.

14. An apparatus according to claim 11, wherein said mask means comprises spatial light modulator means for changing a pattern of light incident thereon according to a mask-writing signal.

15. An apparatus according to claim 11, wherein

the first deflection member, second deflection member and the mask means are linearly arranged so that an input light incident on the first side of the first deflection member and emerging as an output light from the third side of the second deflection member has a first optical path which is linear;

and

the first and second means include optical means for directing the first and second control light beams along second and third optical paths, respectively, from a pumping light source to the first and second deflection members in a direction perpendicular to the first optical path, and first and second limiter means arranged in the first and second optical paths, the first and second limiter means having openings for defining the first and second regions to be irradiated with the first and second control light beams.

16. An apparatus according to claim 15, wherein said first and second limiter means have triangular openings which define prism-like first and second regions having an axis extending in a direction perpendicular to the first optical path.

17. An apparatus according to claim 15, wherein a pattern of each of the openings of the first and second limitter means is variable.

18. An apparatus according to claim 15, wherein said optical means splits a single pumping light emerging from said pumping light source into the first and second control light beams, and sets the third optical path longer than the second optical path by an amount corresponding to a distance between said first and second deflection members.

19. An apparatus according to claim 11, wherein the first deflection member, second deflection member and the mask means are linearly arranged so that an input light incident on the first side of the first deflection member and emerging as an output light from the third side of the second deflection member has a first optical path which is linear;

and

the first and second means include a pumping light source for generating the first and second control light beams, optical means for directing the first and second control light beams along second and third optical paths, respectively, from said pumping light source to said first and second deflection members in a direction perpendicular to the first optical path, and first and second filter means, arranged in the first and second optical paths of the first and second control light beams, respectively, for spatially nonuniformly adjusting radiation intensities of the first and second control light beams to the first and second regions.

20. An apparatus according to claim 19, wherein the first and second filter means have a transparent region and the transparent region is variable.

21. An apparatus according to claim 19, wherein said optical means splits a single pumping light emerging from said pumping light source into the first and second control light beams, and sets the third optical path to be longer than the second optical path by an amount corresponding to a distance between said first and second deflection members.

22. An apparatus according to claim 1, wherein said mask means comprises spatial light modulator means for changing a pattern of light incident thereon according to a mask-writing signal.

23. An apparatus according to claim 1, wherein

the first deflection member, second deflection member and the mask means are linearly arranged so that an input light incident on the first side of the first deflection member and emerging as an output light from the third side of the second deflection member has a first optical path which is linear;

and

the first and second means include optical means for directing the first and second control light beams along second and third optical paths, respectively, from a pumping light source to the first and second deflection members in a direction perpendicular to the first optical path, and first and second limiter means arranged in the first and second optical paths, the first and second limiter means having openings for defining the first and second regions to be irradiated with the first and second control light beams.

24. An apparatus according to claim 3, wherein said first and second limiter means have triangular openings which define prism-like first and second regions having an axis extending in a direction perpendicular to the first optical path.

25. An apparatus according to claim 3, wherein a pattern of each of the openings of the first and second limitter means is variable.

26. An apparatus according to claim 3, wherein said optical means splits a single pumping light emerging from said pumping light source into the first and second control light beams, and sets the third optical path longer than the second optical path by an amount corresponding to a distance between said first and second deflection members.

27. An apparatus according to claim 1, wherein the first deflection member, second deflection member and the mask means are linearly arranged so that an input light incident on the first side of the first deflection member and emerging as an output light from the third side of the second deflection member has a first optical path which is linear;

and

the first and second means include a pumping light source for generating the first and second control light beams, optical means for directing the first and second control light beams along second and third optical paths, respectively, from said pumping light source to said first and second deflection members in a direction perpendicular to the first optical path, and first and second filter means, arranged in the first and second optical paths of the first and second control light beams, respectively, for spatially nonuniformly adjusting radiation intensities of the first and second control light beams to the first and second regions.

28. An apparatus according to claim 8, wherein the first and second filter means have a transparent region and the transparent region is variable.

29. An apparatus according to claim 8, wherein said optical means splits a single pumping light emerging from said pumping light source into the first and second control light beams, and sets the third optical path to be longer than the second optical path by an amount corresponding to a distance between said first and second deflection members.

30. An apparatus according to claim 1, wherein said mask means has a slit.

31. An apparatus according to claim 30, wherein a width of the slit is variable.