Method and apparatus for optical emission end point detection in plasma etching processes

• US 5,308,414 A
• Filed: 12/23/1992
• Issued: 05/03/1994
• Est. Priority Date: 12/23/1992
• Status: Expired due to Term

• Current Assignee: International Business Machines Corporation
• Original Assignee: International Business Machines Corporation
• Inventors: Passow, Michael L., Singh, Jyothi, O'Neill, James A.
• Primary Examiner(s): DANG, THI D
• Application Number:
  US07/995,727
• Time in Patent Office: 496 Days
• Field of Search: 156/626, 156/627, 156/345, 204/298.32, 204/298.03, 204/192.33
• US Class Current: 216/60
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge

Abstract

An apparatus and method for determining the time at which a plasma etching process should be terminated. The process generates at least one etch product species and a continuum plasma emission. The apparatus monitors the optical emission intensity of the plasma in a narrow band centered about a predetermined spectral line and generates a first signal indicative of the spectral intensity of the etch product species. The apparatus further monitors the optical emission intensity of the plasma in a wide band and generates a second signal indicative of the spectral intensity of the continuum plasma emission. The apparatus further monitors the magnitudes of the first and second signals and generates a termination signal when the magnitudes diverge.

Claims

1. An apparatus for determining the time at which a plasma etching process should be terminated, said process generating at least one discrete plasma species indicative of the progress of said process and a continuum plasma emission, comprising:

means for monitoring the optical emission intensity of said plasma in a narrow band centered about a predetermined spectral line and generating a first signal indicative of the spectral intensity of said plasma species;

means for monitoring the optical emission intensity of said plasma in a wide band distinct from said narrow band and the emission spectral line of any discrete plasma species and generating a second signal indicative of the spectral intensity of only said continuum plasma emission; and

means for monitoring the magnitudes of said first and second signals and generating a termination signal when said magnitudes diverge, thereby indicating when said plasma etching process should be terminated.

2. The apparatus of claim 1 wherein said means for monitoring the magnitudes of said first and second signals includes optoelectronic conversion means for converting said first and second optical signals to corresponding first and second electrical signals.

3. The apparatus of claim 2 wherein the optical emission intensity of said plasma varies periodically and wherein said means for monitoring the magnitude of said first and second electrical signals includes a lock-in amplifier responsive to said periodic variations in the optical emission intensity of said plasma for synchronously demodulating said first and second electrical signals.

4. The apparatus of claim 1 wherein said means for generating a termination signal includes means for generating a signal equal to the ratio of said first and second signals.

5. The apparatus of claim 1 wherein said wide band is at least five time the full spectral bandwidth at half maximum intensity of the atomic emission line of said plasma species.

6. The apparatus if claim 5 wherein said means for monitoring the optical emission intensity of said plasma in a wide band includes generating a plurality of distinct wide band signals indicative of said continuum plasma emission and wherein said second signal is the sum of said plurality of distinct signals.

7. A method for determining the time at which a plasma etching process should be terminated, said process generating at least one discrete plasma species indicative of the progress of said process and a contniuum plasma emission, comprising:

monitoring the optical emission intensity of said plasma in a narrow band centered about a predetermined spectral line and generating a first signal indicative of the spectral intensity of said plasma species;

monitoring the optical emission intensity of said plasma in a wide band distinct from said narrow band and the emission spectral line of any discrete plasma species and generating a second signal indicative of the spectral intensity of only said continuum plasma emission;

monitoring the magnitudes of said first and second signals and generating a termination signal when said magnitudes diverge; and

indicating when said plasma etching process should be terminated in response to said termination signal.

8. The method of claim 7 wherein said first and second signals are optical signals and further including the step of converting said first and second optical signals to first and second electrical signals.

9. The method of claim 8 wherein the optical emission intensity of said plasma varies periodically and further includes the steps of

lock-in amplifying said first and second electrical signals;

and

synchronously demodulating said first and second electrical signals in response to said periodic variations in optical emission intensity of said plasma.

10. The method of claim 7 wherein generating said termination signal includes generating a signal equal to the ratio of said first and second signals.

11. The method of claim 7 wherein said wide band is at least five times the full spectral bandwidth at half maximum intensity of the atomic emission line of said plasma species.

12. The method of claim 11 wherein the step of monitoring the optical emission intensity of said plasma in a wide band includes generating a plurality of distinct wide band signals and summing said plurality of distinct signals to produce said second signal.

13. An apparatus for determining the time at which a plasma etching process should be terminated, said process generating at least one discrete plasma species and a continuum plasma emission, comprising:

means for monitoring the optical emission intensity of said plasma in a wide band distinct from the emission spectral line of any discrete plasma species and generating a signal indicative of the spectral intensity of only said continuum plasma emission; and

means for monitoring said intensity signal and generating a termination signal when the magnitude of said signal changes a predetermined magnitude, thereby indicating when said plasma etching process shall be terminated.

14. An apparatus for determining the time at which a plasma etching process should be terminated, said process generating at least one plasma species indicative of the progress of said process comprising:

means for monitoring the optical emission intensity of said plasma in a narrow band centered about a predetermined spectral line and generating a first signal indicative of the spectral intensity of said plasma species;

means responsive to changes in an electrical property of said plasma for generating a second signal indicative thereof; and

means for monitoring the magnitudes of said first and second signals and generating a termination signal when said magnitudes diverge, thereby indicating when said plasma etching process should be terminated.

15. The apparatus of claim 14 wherein said electrical property is the electron density of said plasma.

16. The apparatus of claim 14 wherein said electrical property is the electron temperature of said plasma.