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Method and apparatus for making a predistorted reticle to compensate for lens distortions

  • US 5,308,991 A
  • Filed: 06/02/1992
  • Issued: 05/03/1994
  • Est. Priority Date: 06/02/1992
  • Status: Expired due to Term
First Claim
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1. A method for producing predistorted masks or reticles which correct for lens field errors for use in the fabrication of integrated circuit devices, wherein the mask or reticle is produced by controlling the movement of a movable stage containing the mask or reticle, where the stage is disposed beneath a writing tool which writes pattern data to form the mask or reticle, the method comprising:

  • expressing a lens error in terms of lens distortion data;

    converting the lens distortion data into correction terms, wherein the correction terms are a function of the location on the lens through which radiation passes; and

    using the correction terms to control the positioning of the stage, thereby causing the stage to move so that when the writing tool writes pattern data which has not been corrected for the lens error, there is produced a mask or reticle which compensates for the lens error when it is used in conjunction with the lens to fabricate a semiconductor device.

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