Method and apparatus for making a predistorted reticle to compensate for lens distortions

• US 5,308,991 A
• Filed: 06/02/1992
• Issued: 05/03/1994
• Est. Priority Date: 06/02/1992
• Status: Expired due to Term

• Current Assignee: National Semiconductor Corporation (Texas Instruments, Inc.)
• Original Assignee: National Semiconductor Corporation (Texas Instruments, Inc.)
• Inventors: Kaplan, Shay
• Primary Examiner(s): Berman, Jack I.
• Assistant Examiner(s): Beyer, James
• Application Number:
  US07/892,277
• Time in Patent Office: 700 Days
• Field of Search: 250/492.22, 250/492.2, 250/492.1, 250/492.3, 430/5, 355/52, 355/53, 378/34, 378/35
• US Class Current: 250/492.22
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: G03F 1/70 Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
• CPC Class Codes: G03F 7/70433 Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
• CPC Class Codes: G03F 7/706 Aberration measurement
• CPC Class Codes: H01J 37/3045 Object or beam position registration
• CPC Class Codes: H01J 37/3174 Particle-beam lithography, e.g. electron beam lithography

Abstract

A method and apparatus for making predistorted masks or reticles which compensate for lens field errors for use in the fabrication of integrated circuit devices. The lens error is first expressed as distortion data. The data is used to produce correction terms which are applied to an interferometrically controlled stage which positions the mask or reticle beneath a writing tool. When the predistorted mask or reticle is used in conjunction with the lens for which the distortion data was obtained, an integrated circuit device is produced which does not incorporate the lens field errors.

Claims

1. A method for producing predistorted masks or reticles which correct for lens field errors for use in the fabrication of integrated circuit devices, wherein the mask or reticle is produced by controlling the movement of a movable stage containing the mask or reticle, where the stage is disposed beneath a writing tool which writes pattern data to form the mask or reticle, the method comprising:

expressing a lens error in terms of lens distortion data;

converting the lens distortion data into correction terms, wherein the correction terms are a function of the location on the lens through which radiation passes; and

using the correction terms to control the positioning of the stage, thereby causing the stage to move so that when the writing tool writes pattern data which has not been corrected for the lens error, there is produced a mask or reticle which compensates for the lens error when it is used in conjunction with the lens to fabricate a semiconductor device.

2. The method of claim 1 wherein the lens distortion data is expressed as the image displacement caused by the lens as a function of a radial coordinate on the lens surface.

3. The method of claim 1 wherein the lens distortion data is expressed as the image displacement caused by the lens as a function of x any y coordinates on the lens surface.

4. The method of claim 1 wherein the correction terms are expressed as functions of the x and y coordinates of positions on the lens surface.

5. The method of claim 1 wherein the stage positioning is controlled by a laser interferometer.

6. The method of claim 5 wherein the laser interferometer has a port for input of a wavelength correction factor, and further wherein the correction terms are input into the interferometer'"'"'s wavelength correction factor port.

7. The method of claim 6 wherein the interferometer'"'"'s wavelength correction factor port is a port for input of environmental data.

8. The method of claim 5 wherein the interferometrically controlled stage uses a compensation value to correct the wavelength of the laser, and further, wherein the correction terms are used to control the positioning of the stage by adjusting the compensation value.

9. A method for producing predistorted masks or reticles which correct for lens field errors for use in the fabrication of integrated circuit devices, wherein the mask or reticle is produced by controlling the movement of a movable stage containing the mask or reticle, where the stage is disposed beneath a writing tool which writes pattern data to form the mask or reticle, the method comprising:

expressing a lens error in terms of lens distortion data;

expressing the lens distortion data as a lens error function, wherein the lens error function is a function of either the radial or x and y coordinates on the lens surface;

using the lens error function to generate correction terms, wherein the correction terms are a function of the location on the lens through which radiation passes; and

using the correction terms to control the positioning of the stage, thereby causing the stage to move so that when the writing tool writes pattern data which has not been corrected for the lens error, there is produced a mask or reticle which compensates for the lens error when it is used in conjunction with the lens to fabricate a semiconductor device.

10. Apparatus for producing predistorted masks or reticles which correct for lens field errors for use in the fabrication of integrated circuit devices, wherein the apparatus includes a writing tool which writes pattern data to form the mask or reticle and a movable stage containing the mask or reticle which is disposed beneath the writing tool, the lens error being expressed in terms of lens distortion data, the apparatus comprising:

conversion means for converting the lens distortion data into correction terms, wherein the correction terms are a function of the location on the lens through which radiation passes; and

control means responsive to the correction terms for controlling the position of the stage, thereby causing the stage to move so that when the writing tool writes pattern data which has not been corrected for the lens error, there is produced a mask or reticle which compensates for the lens error when it is used in conjunction with the lens to fabricate a semiconductor device.

11. The apparatus of claim 10 wherein the lens distortion data is expressed as the image displacement caused by the lens as a function of a radial coordinate on the lens surface.

12. The apparatus of claim 10 wherein the lens distortion data is expressed as the image displacement caused by the lens as a function of x and y coordinates on the lens surface.

13. The apparatus of claim 10 wherein the correction terms are expressed as functions of the x any y coordinates of positions on the lens surface.

14. The apparatus of claim 10 wherein the stage positioning is controlled by a laser interferometer.

15. The apparatus of claim 14 wherein the laser interferometer has a port for input of a wavelength correction factor, and further wherein the correction terms are input into the interferometer'"'"'s wavelength correction factor port.

16. The apparatus of claim 15 wherein the interferometer'"'"'s wavelength correction factor port is a port for input of environmental data.

17. The apparatus of claim 14 wherein the interferometrically controlled stage uses a compensation value to correct the wavelength of the laser, and further, wherein the correction terms are used to control the position of the stage by adjusting the compensation value.