Thin film transistor with nitrogen concentration gradient
First Claim
1. A thin film transistor comprising:
- a silicon active layer including source and drain regions and a channel region formed between and connecting the source and drain regions;
an electrically conductive auxiliary film comprising a silicon film doped with nitrogen, and formed on surfaces of the source, channel, and drain regions of the active layer, a nitrogen concentration in the auxiliary film having a distribution in a direction of film thickness such that the nitrogen concentration is gradually reduced toward the active layer;
source and drain ohmic contact layers separated from each other and formed on and contacting separate parts of a surface of the auxiliary film corresponding to the source and drain regions, respectively;
source and drain electrodes contacting the source and drain ohmic contact layers, respectively; and
a gate electrode opposite to the channel region of the active layer with a gate insulating film interposed therebetween.
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Abstract
An inverted stagger thin film transistor includes an insulating substrate, a silicon active layer formed thereon, source and drain ohmic contact layers, source and drain electrodes respectively contacting the source and drain ohmic contact layers, and a gate electrode opposite to the channel region of the active layer through a gate insulating film. An auxiliary film consisting of a silicon film doped with nitrogen is formed in the surface of the active layer, and the ohmic contact layers contact the auxiliary film. The auxiliary film can be continuously formed from the active layer to the ohmic contact layers, thereby improving a junction state between the active layer and the ohmic contact layers.
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Citations
14 Claims
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1. A thin film transistor comprising:
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a silicon active layer including source and drain regions and a channel region formed between and connecting the source and drain regions; an electrically conductive auxiliary film comprising a silicon film doped with nitrogen, and formed on surfaces of the source, channel, and drain regions of the active layer, a nitrogen concentration in the auxiliary film having a distribution in a direction of film thickness such that the nitrogen concentration is gradually reduced toward the active layer; source and drain ohmic contact layers separated from each other and formed on and contacting separate parts of a surface of the auxiliary film corresponding to the source and drain regions, respectively; source and drain electrodes contacting the source and drain ohmic contact layers, respectively; and a gate electrode opposite to the channel region of the active layer with a gate insulating film interposed therebetween. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. An inverted staggered thin film transistor comprising:
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a silicon active layer including source and drain regions and a channel region formed between and connecting the source and drain regions; an electrically conductive auxiliary film comprising a silicon film doped with nitrogen, and formed on surfaces of the source, channel, and drain regions of the active layer, a nitrogen concentration in the auxiliary film having a distribution in a direction of film thickness such that the nitrogen concentration is gradually reduced toward the active layer; source and drain ohmic contact layers separated from each other and formed on and contacting separate parts of a surface of the auxiliary film corresponding to the source and drain regions, respectively; source and drain electrodes contacting the source and drain ohmic contact layers, respectively; and a gate electrode opposite to the channel region of the active layer with a gate insulating film interposed therebetween. - View Dependent Claims (10, 11, 12, 13, 14)
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Specification