Method of providing an abrasion resistant coating

• US 5,320,875 A
• Filed: 08/27/1993
• Issued: 06/14/1994
• Est. Priority Date: 12/21/1992
• Status: Expired due to Term

• Current Assignee: The Dow Chemical Company (Dow, Inc.)
• Original Assignee: The Dow Chemical Company (Dow, Inc.)
• Inventors: Hu, Ing-Feng, Tou, James C.
• Primary Examiner(s): PIANALTO, BERNARD D
• Application Number:
  US08/112,723
• Time in Patent Office: 291 Days
• Field of Search: 427/489, 427/493, 427/495, 427/539, 427/571, 427/578, 427/585, 427/598, 427/255.3, 427/255.6, 427/255.7, 427/407.1
• US Class Current: 427/493
• CPC Class Codes: C23C 16/30 Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
• CPC Class Codes: C23C 16/401 containing silicon
• CPC Class Codes: C23C 16/45561 Gas plumbing upstream of the reaction chamber
• CPC Class Codes: C23C 16/517 using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
• CPC Class Codes: Y10T 428/31663 As siloxane, silicone or silane

Abstract

A method of preparing a coated substrate is disclosed. The substrate is coated with a plasma generated polymer containing Si, Or C and H in specific atom ratio wherein the polymer also contains certain functional groups, A power density of about 10⁶ to about 10⁸ J/Kg is employed in the plasma polymerization process.

Claims

1. A method of providing an abrasion resistant coating onto the surface of a substrate employing plasma enhanced chemical vapor deposition of an organosilicone monomer gas in a plasma reaction zone and oxygen gas which comprises plasma polymerizing the organosilicone monomer in the presence of excess oxygen employing a power density within the range of about. 10⁶ to about 10⁸ J/Kg in the presence of the substrate.

2. The method of claim 1 including the step of conducting the oxygen and organosilicone monomer gases in a direction which is essentially perpendicular to the substrate surface and through a magnetic field of at least 100 gauss which is contained essentially in a zone adjacent to the plasma zone and into the plasma reaction zone.

3. The method of claim 1 wherein the organosilicone monomer and oxygen gases are flowed through a cathode in a direction which is essentially perpendicular to the surface of the substrate which is contained on an anode, said cathode also providing a magnetic field.

4. The method of claim 1 including the subsequent step of rendering the abrasion-resistant coating more hydrophobic by treating the abrasion resistant coating with a plasma polymerized second organosilicone coating.

5. The method of claim 1 including the subsequent step of treating the SiO_x coating on the abrasion resistant layer with O₂ plasma to render the coating more hydrophilic.