×

Patterning of semiconductive polymers

  • US 5,328,809 A
  • Filed: 08/22/1991
  • Issued: 07/12/1994
  • Est. Priority Date: 08/24/1990
  • Status: Expired due to Term
First Claim
Patent Images

1. A method of forming in a semiconductive conjugated polymer at least a first region and a second region having different optical properties from one another, said method comprising:

  • (a) forming a layer of a precursor polymer, wherein the precursor polymer comprises a poly(arylene-1,2-ethanediyl) polymer having a proportion of the ethane groups including a modifier group whose susceptibility to elimination is increased in the presence of an acid;

    (b) generating in the layer of precursor polymer the first region having a first optical property and the second region having a second optical property, said step of generating the first region includes the step of contacting the first region of the precursor polymer with an amount of acid and heating sufficiently to generate a first region of a semiconductive conjugated polymer having a first optical property, wherein the step of contacting the first region with acid comprises;

    (i) providing the acid to the layer of precursor polymer wherein the acid is provided to the precursor polymer by release from the precursor polymer in the presence of heat; and

    (ii) applying a protective coating in a pattern to the surface of the layer of precursor polymer to form a coated portion and an uncoated portion of the precursor polymer wherein the coated portion traps the acid.

View all claims
  • 4 Assignments
Timeline View
Assignment View
    ×
    ×