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Method for reducing, by a factor or 2.sup.-N, the minimum masking pitch of a photolithographic process

  • US 5,328,810 A
  • Filed: 11/25/1992
  • Issued: 07/12/1994
  • Est. Priority Date: 05/07/1990
  • Status: Expired due to Term
First Claim
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1. A method for manufacturing an integrated circuit, comprising the following sequence of steps:

  • (a) forming a primary mask strip, said mask strip having a first feature width;

    (b) transforming the primary mask strip into a mandrel strip, said mandrel strip having substantially vertical sidewalls and a second feature width that is less than said first feature width;

    (c) forming stringer strips on the sidewalls of said mandrel strip, each of said stringer strips having a third feature width; and

    (d) removing the mandrel strip from between the stringer strips.

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