Case for photomask

• US 5,330,053 A
• Filed: 07/07/1993
• Issued: 07/19/1994
• Est. Priority Date: 02/07/1991
• Status: Expired due to Term

• Current Assignee: Dai Nippon Printing Company Limited
• Original Assignee: Dai Nippon Printing Company Limited
• Inventors: Yamauchi, Takashi, Tabuchi, Kazuhiro, Inomata, Hiroyuki
• Primary Examiner(s): FIDEI, DAVID
• Application Number:
  US08/088,861
• Time in Patent Office: 377 Days
• Field of Search: 206/334, 206/454, 206/455, 206/523, 206/594, 378/182, 378/188
• US Class Current: 206/455
• CPC Class Codes: B65D 81/02 specially adapted to protect contents from mechanical damage containers of polygonal cross-section provided with internal protecting elements for contents B65D5/50; devices to locate articles in containers B65D25/10
• CPC Class Codes: G03F 1/66 Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
• CPC Class Codes: G03F 7/70741 Handling masks outside exposure position, e.g. reticle libraries

Abstract

The present invention relates to a case for a photomask to prevent generation of dust which might attach to and stain a photomask or the photomask pellicle. In a case for a photomask comprising a case main unit with an upper opening for accommodating the photomask and a lid for the opening of the case main unit, cushion materials are provided on the inner bottom of the case main unit and on the inner ceiling of the lid. The photomask is elastically squeezed between the cushion materials when accommodated. Thus, shaking and rattling during transportation are prevented to minimize the generation of dust. As the cushion material, a rubber material having a smooth surface on one side and a coarse surface on the other side is used.

Claims

1. A case for a plate for use in a photolithographic process, comprising a case main unit having an upper opening for accommodating the plate, a lid for the opening of the case main unit, a lower cushion on an inner bottom of the case main unit, and an upper cushion removably disposed on an inner ceiling of the lid, whereby the plate is accommodated as elastically squeezed at opposite peripheral ends of the plate between the upper and lower cushions, wherein the upper cushion has a smooth surface on the side touching the inner surface of the lid and has a coarse surface on the side touching the accommodated plate, and the upper cushion is not adhered to the inner surface of the lid, wherein the upper and lower cushions are made of a rubber from the group consisting of a silicone rubber or a fluoro-rubber.

2. A case according to claim 1, for a photomask.

3. A case according to claim 1, for a photomask substrate.

4. A case for a plate for use in a photolithographic process, comprising a case main unit having an upper opening for accommodating the plate, a lid for the opening of the case main unit, a lower cushion on an inner bottom of the case main unit, and an upper cushion removably disposed on an inner ceiling of the lid, whereby the plate is accommodated as elastically squeezed at opposite peripheral ends of the plate between the upper and lower cushions, wherein the upper cushion has a smooth surface on the side touching the inner surface of the lid and a single-sided adhesive tape made of a material not adherent to glass is attached on the side of the upper cushion touching the accommodated plate, and the upper cushion is not adhered to the inner surface of the lid, and wherein the upper and lower cushions are made of a rubber from the group consisting of a silicone rubber or a fluoro-rubber.

5. A case according tot claim 4, for a photomask.

6. A case according to claim 4, for a photomask substrate.