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Lift fingers for substrate processing apparatus

  • US 5,332,443 A
  • Filed: 06/09/1993
  • Issued: 07/26/1994
  • Est. Priority Date: 06/09/1993
  • Status: Expired due to Fees
First Claim
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1. A substrate processing apparatus comprising:

  • a thermal reactor including a substrate processing chamber; and

    lifting apparatus for lifting a substrate within the chamber including(i) at least one substrate lifting element having a substrate engaging end and a securing tab;

    (ii) a lifting element support having a seat formed therein, wherein the seat is sized to receive the tab of the lifting element;

    (iii) a fastener for securing the tab into the seat; and

    (iv) an adjuster located between the tab and the seat and operable to adjust the position of the substrate engaging end,whereby, when the tab is secured in the seat and the adjuster is operated, the lifting element is caused to move in a plane parallel to a plane formed through the center of the fastener and the adjuster.

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