Chemical/mechanical polishing for ULSI planarization

• US 5,332,467 A
• Filed: 09/20/1993
• Issued: 07/26/1994
• Est. Priority Date: 09/20/1993
• Status: Expired due to Term

• Current Assignee: Transpacific IP Group Limited
• Original Assignee: Industrial Technology Research Institute
• Inventors: Lu, Chih-Yuan, Sune, Ching-Tzong
• Primary Examiner(s): POWELL, WILLIAM A
• Application Number:
  US08/122,948
• Time in Patent Office: 309 Days
• Field of Search: 156/636, 156/637, 156/643, 156/645, 156/655, 156/657, 156/659.1, 156/662, 156/667, 156/644, 156/656, 437/225, 437/228, 437/235, 437/238, 437/245, 51/281 R, 51/317
• US Class Current: 438/633
• CPC Class Codes: H01L 21/31053 involving a dielectric removal step

Abstract

A method of planarizing a wafer surface by using a polishing stop with chemical/mechanical polishing is described. A semiconductor wafer, on which there is a rugged surface with broad indentations, is provided. A first layer is formed over the rugged surface. A hard film layer is formed over the first layer. The first layer and the hard film layer are patterned to form polishing stop islands in the broad indentations. A second layer is formed over the rugged surface and the polishing stop islands, to create a top surface for polishing, the top surface and the rugged surface being less hard than the hard film layer. The top surface is polished in a vertical direction to remove portions of the top surface, until the top surface is co-planar with the top of the polishing stop islands. The remainder of the hard film layer is removed to complete the planar surface.

Claims

1. A method of forming a planar surface on a semiconductor wafer, on which there is a rugged surface with broad indentations, comprising the steps of:

forming a first layer over said rugged surface;

forming a hard film layer over said first layer;

patterning said first layer and said hard film layer to form polishing stop islands in the broad indentations;

forming a second layer over said rugged surface and said polishing stop islands, to create a top surface for polishing, said top surface and said rugged surface being less hard than said hard film layer;

polishing said top surface in a vertical direction to remove portions of said top surface, until said top surface is co-planar with top of said polishing stop islands; and

removing the remainder of said hard film layer to complete said planar surface.

2. The method of claim 1 wherein said polishing is by chemical/mechanical polishing.

3. The method of claim 2 wherein said chemical/mechanical polishing is with a polishing slurry containing aluminum oxide.

4. The method of claim 1 wherein said hard film layer is a diamond film.

5. The method of claim 4 wherein said diamond film is a diamond-like carbon film.

6. The method of claim 4 wherein said diamond film is patterned by ion beam assisted etching.

7. The method of claim 1 wherein said hard film layer is niobium carbide.

8. A method of forming a planar surface on a semiconductor wafer on which there is a first dielectric layer and a patterned first metal layer, comprising the steps of:

forming a second dielectric layer with broad indentations over said first dielectric layer and said patterned first metal layer;

forming a third dielectric layer over said second dielectric layer;

forming a hard film layer over said third dielectric layer;

patterning said third dielectric layer and said hard film layer to form polishing stop islands in said broad indentations;

forming a fourth dielectric layer over said second dielectric layer and said polishing stop islands, to create a top surface for polishing, said fourth and second dielectric layers being less hard than said hard film layer;

polishing said top surface in a vertical direction to remove portions of said top surface, until said top surface is co-planar with top of said polishing stop islands; and

removing the remainder of said hard film layer to complete said planar surface.

9. The method of claim 8 wherein said polishing is by chemical/mechanical polishing.

10. The method of claim 9 wherein said chemical/mechanical polishing is with a polishing slurry containing aluminum oxide.

11. The method of claim 8 wherein said hard film layer is a diamond film.

12. The method of claim 11 wherein said diamond film is patterned by ion beam assisted etching.

13. The method of claim 8 wherein said second, third and fourth dielectric layers are silicon oxide deposited by low pressure chemical vapor deposition.

14. A method of forming a semiconductor wafer having multiple levels of metallization with planar interlevel dielectric layers between each level of metallization, on which there is a first dielectric layer with broad indentations and a patterned first metal layer, comprising the steps of:

forming a second dielectric layer over said first dielectric layer and said patterned first metal layer;

forming a third dielectric layer over said second dielectric layer;

forming a hard film layer over said third dielectric layer;

patterning said third dielectric layer and said hard film layer to form polishing stop islands in the broad indentations;

forming a fourth dielectric layer over said second dielectric layer and said polishing stop islands, to create a top surface for polishing, said fourth and second dielectric layers being less hard than said hard film layer;

polishing said top surface in a vertical direction to remove portions of said top surface, until said top surface is co-planar with top of said polishing stop islands; and

removing the remainder of said hard film layer to complete said planar surface and form an interlevel dielectric.

15. The method of claim 14 further comprising the steps of:

etching said planar surface to create vias and thus expose said first metal layer; and

forming and patterning a second metal layer on said planar surface and in said vias.

16. The method of claim 15 further comprising the steps of creating a plurality of planar interlevel dielectrics and levels of metal on top of said second metal layer, by repeating the same steps.

17. The method of claim 14 wherein said polishing is by chemical/mechanical polishing.

18. The method of claim 17 wherein said chemical/mechanical polishing is with a polishing slurry containing aluminum oxide.

19. The method of claim 14 wherein said hard film layer is a diamond film.

20. The method of claim 19 wherein said diamond film is a diamond-like carbon film.