Heating apparatus

• US 5,332,557 A
• Filed: 01/19/1993
• Issued: 07/26/1994
• Est. Priority Date: 01/22/1992
• Status: Expired due to Term

• Current Assignee: Tokyo OHKA Kogyo Company Limited
• Original Assignee: Tokyo OHKA Kogyo Company Limited
• Inventors: Miyamoto, Hidenori, Sahoda, Tsutomu, Hori, Hisashi, Sago, Hiroyoshi, Mizuki, Hideyuki
• Primary Examiner(s): Warden, Robert J.
• Assistant Examiner(s): Dawson, E. Leigh
• Application Number:
  US08/005,602
• Time in Patent Office: 553 Days
• Field of Search: 422/109, 422/186, 422/186.04, 422/186.05, 422/186.13, 422/186.22, 422/186.23, 422/199, 422/300, 422/307, 422/906, 118/724, 118/725, 118/728, 219/390, 392/416, 392/418
• US Class Current: 422/199
• CPC Class Codes: G05D 23/1934 each space being provided with one sensor acting on one or more control means
• CPC Class Codes: G05D 23/22 the sensing element being a thermocouple
• CPC Class Codes: H01L 21/67115 mainly by radiation
• CPC Class Codes: H01L 21/67757 vertical transfer of a batch of workpieces
• CPC Class Codes: Y10S 422/906 Plasma or ion generation means

Abstract

A plurality of workpieces are supported on a workpiece holder disposed over an opening defined in a horizontal base plate and connected to an evacuating device. A reaction chamber, which is supported on an arm of a lifting and lowering device, is vertically movable with respect to the base plate between a lowered position in which the reaction chamber defines a closed space which accommodates the workpieces therein and a lifted position in which the workpieces are exposed out of the reaction chamber. A heating device, which is supported on an arm of another lifting and lowering device, is vertically movable with respect to the base plate between a lowered position in which the heating device surrounds the reaction chamber and a lifted position in which the reaction chamber is exposed out of the heating device.

Claims

1. A heating apparatus for curing films coated on workpieces, the apparatus comprising:

a base plate having an opening defined therein which is connected to an evacuating device;

a workpiece holder disposed over said opening for holding workpieces;

a reaction chamber vertically movable with respect to said baseplate between a lowered position in which said reaction chamber defines a closed space which accommodates the workpieces therein and a lifted position in which the workpieces are exposed out of the reaction chamber;

a heating device vertically movable with respect to said base plate between a lowered position in which the heating device surrounds said reaction chamber for heating the reaction chamber to cure films coated on the workpieces and a lifted position in which said reaction chamber is exposed out of the heating device;

means for vertically moving said reaction chamber with respect to said workpiece holder between said lowered and lifted positions of the reaction chamber; and

means for vertically moving said heating device independently of said reaction chamber between said lowered and lifted positions of said heating device.

2. A heating apparatus according to claim 1, wherein said heating device comprises a plurality of vertically spaced, independently controllable heater segments and means for independently controlling said heater segments to achieve a single, substantially uniform temperature distribution about said workpiece holder in said reaction chamber.

3. A heating apparatus according to claim 2, wherein said heating device further comprises means for independently controlling said heater segments, said heater control means is adapted to energize said heater segments with more electric energy in the lower region of said heating device than in an upper region thereof.

4. A heating apparatus according to claim 1, further comprising a support frame mounted on said base plate, said workpiece holder being mounted on said support frame such that the workpiece holder is disposed in an upper portion of said reaction chamber and said support frame is disposed in a lower portion of said reaction chamber when said reaction chamber is in its lowered position.

5. A heating apparatus according to claim 3, wherein said workpiece holder is removably mounted on said support frame.

6. A heating apparatus according to claim 4, wherein said support frame comprises a plurality of vertical support columns mounted on said base plate and a plurality of vertically spaced horizontal plates attached to said vertical support columns.

7. A heating apparatus according to claim 6, wherein said horizontal plates are spaced more widely in an upper region of said support frame than in a lower region thereof.

8. A heating apparatus according to claim 4, wherein said support frame has positioning teeth on an upper surface thereof.

9. A heating apparatus according to claim 8, wherein said workpiece holder has collars on a lower surface thereof which are fittable over said positioning teeth, respectively.

10. A heating apparatus according to claim 8, wherein one of said positioning teeth has a different length or diameter than the other positioning teeth.

11. A heating apparatus according to claim 1, further comprising electrodes disposed around said reaction chamber and connected to a high-frequency power supply.

12. A heating apparatus according to claim 1, wherein said workpiece holder comprises four vertical support columns positioned respectively at the vertices of a trapezoidal shape in a horizontal plane, each of said vertical support columns having a plurality of vertically spaced grooves defined therein.

13. A heating apparatus according to claim 1, wherein said means for vertically moving said reaction chamber comprises a vertically movable arm and an annular seal attached to a lower surface of said arm, said reaction chamber having a lower end placed on an upper surface of said annular seal for vertical movement in unison with said arm.

14. A heating apparatus according to claim 1, further comprising a thermocouple having an end mounted on said base plate, said thermocouple being positioned in said closed space defined by said reaction chamber when is in said lowered position.

15. A heating apparatus according to claim 1, wherein said heating device comprises an outer case, an inner case disposed in said outer case, thermal insulation disposed between said outer case and said inner case, and a heating element positioned on an inner circumferential surface of said thermal insulation.

16. A heating apparatus according to claim 15, further comprising a cooling duct through which a space between said thermal insulation and said inner case communicates with an outer space surrounding said heating device.

17. A heating apparatus for heating workpieces to cure films coated on the workpieces, the apparatus comprising:

holder means for holding the workpieces;

a reaction chamber for accommodating said holder means with the workpieces held thereby, said reaction chamber being movable to a position in which the workpieces are exposed out of the reaction chamber;

electrode means disposed around said reaction chamber for generating a plasma in the reaction chamber;

heater means for heating said reaction chamber in covering relationship thereto to cure films coated on the workpieces, said heater means being movable to a position in which the reaction chamber is exposed out of the heater means;

means for vertically moving said reaction chamber with respect to said holder means; and

means for vertically moving said heater means with respect to said reaction chamber independently of said reaction chamber moving means.

18. A heating apparatus according to claim 17, further comprising evacuating means for evacuating said reaction chamber while said holder means with the workpieces held thereby is accommodated in said reaction chamber.

19. A heating apparatus according to claim 17, further comprising a base plate, said holder means being removably supported on said base plate, said reaction chamber being movable away from said base plate to said position in which the workpieces are exposed and said heater means being movable away from said base plate to said position in which the reaction chamber is exposed.

20. A heating apparatus according to claim 19, further comprising evacuating means for evacuating said reaction chamber through said base plate while said holder means with the workpieces held thereby is accommodated in said reaction chamber.

21. A heating apparatus according to claim 17, further comprising a base plate and a support frame mounted on said base plate, said holder means being removably mounted on said support frame such that said holder means is disposed within an upper portion of said reaction chamber and said support frame is disposed within a lower portion of said reaction chamber when said reaction chamber accommodates said holder means.

22. A heating apparatus according to claim 17, wherein said heater means comprises a plurality of independently controllable heater segments disposed in spaced regions, respectively, and means for independently controlling said heater segments to achieve a single, substantially uniform temperature distribution about said holder means in said reaction chamber.

23. A heating apparatus according to claim 17, wherein said heater means comprises an outer case, an inner case disposed in said outer case, thermal insulation disposed between said outer case and said inner case, and a heating means positioned on an inner circumferential surface of said thermal insulation.

24. Apparatus for curing films on workpieces, comprising:

holder means for holding workpieces having films coated thereon;

a reaction chamber for accommodating said holder means with the workpieces held thereby;

means for evacuating the reaction chamber to dry the coated films on the workpieces;

heater means for heating said reaction chamber in covering relationship thereto to cure the dried, coated films on the workpieces; and

means for vertically moving said reaction chamber and said heater means between lowered positions in which the reaction chamber and heater means are disposed about the holder means and lifted positions in which said reaction chamber and said heater means are not disposed about said holder means, said moving means being adapted to move said reaction chamber and said heater means independently of each other.

25. Apparatus according to claim 24, including:

a base plate having an opening defined therein, the evacuating means being fixed to said base plate and being adapted to evacuate said reaction chamber through said opening in the base plate; and

said evacuating means being adapted to evacuate said reaction chamber at a relatively low temperature below a temperature to which said reaction chamber is heated by said heating means.