Aberration free lens system for electron microscope

• US 5,336,891 A
• Filed: 06/16/1992
• Issued: 08/09/1994
• Est. Priority Date: 06/16/1992
• Status: Expired due to Fees

• Current Assignee: ARCH Development Corporation (University of Chicago)
• Original Assignee: ARCH Development Corporation (University of Chicago)
• Inventors: Crewe, Albert V.
• Primary Examiner(s): Anderson, Bruce C.
• Application Number:
  US07/899,433
• Time in Patent Office: 784 Days
• Field of Search: 250/396 R, 250/396 M, 250/398
• US Class Current: 250/396.00R
• CPC Class Codes: H01J 3/12 Arrangements for controlling cross-section of ray or beam; Arrangements for correcting aberration of beam, e.g. due to lenses H01J3/02, H01J3/04 take precedence
• CPC Class Codes: H01J 37/153 Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators

Abstract

A system for reducing aberration effects in a charged particle beam. The system includes a source of charged particles, such as electrons or ions, and various building blocks for operating on the charged particle beam to generate a desired particle beam pattern. These building blocks can include at least one of a uniform magnetic field component and a uniform electrostatic field component arrangeable in different combinations, enabling coefficients of spherical and chromatic aberration to be canceled out thereby providing a charged particle beam having greatly diminished aberration.

Claims

1. A system for reducing aberration of a charged particle beam, comprising:

means for generating a charged particle beam; and

building block means for generating at least one of (1) a magnetic field and (2) a combination of a magnetic field and an electrostatic field for controlling said charged particle beam from a focal point at an entrance to said building block means to a focal point at an exit from said building block means and each building block of said building block means having coefficients of spherical and chromatic aberration equal and opposite and having a numerical value which is an integral multiple of one-half a characteristic length l being a distance at which said charged particle beam is focused along the axis of a uniform magnetic field generated by said building block means.

2. The system as defined in claim 1 wherein two of said building blocks have negative values of said coefficient of spherical aberration while the other two said building blocks have positive values of spherical aberration.

3. A system for operating on a charged particle beam to reduce aberration in the beam, comprising:

means for generating a uniform magnetic field whose axis is along the general direction of motion of said charged particle beam; and

means for generating a uniform electrostatic field at right angles to the uniform magnetic field, the charged particles being deflected by the magnetic field and electrostatic field in a direction at right angles to both of the fields and brought to a focus at a distance l along the axis of the uniform magnetic field as it would have been without the electrostatic field with coefficients of aberration summing to zero.

4. The system as defined in claim 3 wherein coefficients of spherical and chromatic aberration are equal and opposite in sign.

5. A system for operating on a charged particle beam to reduce aberration in the beam, comprising:

means for generating a charged particle beam;

means for generating a uniform magnetic field whose axis is along the general direction of motion of said charged particle beam; and

means for generating a uniform electrostatic field parallel to said magnetic field and causing said charged particle beam to be reflected back to and refocused in a plane of origin from said means for generating the charged particle beam with the aberrations from the uniform magnetic field and the uniform electrostatic field having equal magnitude and opposite sign.

6. The system as defined in claim 5 wherein said charged particle beam has an angle of convergence at an image formed by said beam being equal to an angle of emission from said means for generating the charged particle beam.

7. The system as defined in claim 5 further including means for generating another uniform electrostatic field at right angles to the uniform magnetic field causing said charged particle beam to be deflected by the magnetic field and said another electrostatic field and said uniform electrostatic field of claim 5 combining to cause refocusing of said charged particle beam in a plane of origin from said means for generating the charged particle beam, thereby enabling separation of an incoming charged particle beam from an outgoing charged particle beam.

8. The system as defined in claim 5 wherein said system comprises an imaging system for said charged particle beam.