Tungsten silicide etch process selective to photoresist and oxide

• US 5,338,398 A
• Filed: 12/23/1992
• Issued: 08/16/1994
• Est. Priority Date: 03/28/1991
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Lum, Robert, Szwejkowski, Chester A., Fried, Thierry
• Primary Examiner(s): Hearn, Brian E.
• Assistant Examiner(s): GOUDREAU, GEORGE A
• Application Number:
  US07/996,379
• Time in Patent Office: 601 Days
• Field of Search: 156/656, 156/662, 156/664, 156/643, 156/646, 156/657, 156/655
• US Class Current: 438/720
• CPC Class Codes: H01L 21/32137 of silicon-containing layers

Abstract

A process for etching tungsten silicide on a semiconductor wafer in a vacuum etch chamber in the presence of a plasma is described using chlorine (Cl₂) and oxygen-bearing etchant gases in a ratio of not more that 20 volume % oxygen-bearing etchant gas, and preferably from about 6 to about 10 volume % oxygen-bearing etchant gas. The process is also capable of etching polysilicon and exhibits a high selectivity for both photoresist and oxide.

Claims

1. A plasma etching process for etching both tungsten silicide and polysilicon layers on a semiconductor wafer using chlorine gas and an oxygen-bearing etchant gas, in a ratio of from 90 to 94 volume % chlorine and from 6 to 10 volume % oxygen-bearing gas, characterized by a high selectivity to both photoresist and silicon oxide which comprises;

a) mounting on a wafer support platform in a vacuum etching chamber a semiconductor wafer having an oxide portion formed thereon, polysilicon over said oxide, tungsten silicide over said polysilicon, and a photoresist mask over said tungsten silicide;

b) flowing into said chamber;

i) from 50 to 100 volume % of an etchant gas mixture consisting essentially of chlorine gas and an oxygen-bearing gas in a volume ratio of from 90 to 94 volume % chlorine and from 6 to 10 volume % oxygen-bearing gas; and

ii) from 0 to 50 volume % of one or more inert carrier gases;

c) igniting a plasma in said vacuum etching chamber, between said cathode wafer support and the grounded walls of said vacuum chamber while said etchant gas mixture is flowing through said chamber to etch both said tungsten silicide and said polysilicon through said photoresist mask down to said underlying oxide portion on said wafer.

2. The etching process of claim 1 wherein said plasma is maintained during said flow of etchant gases into said chamber at a power level ranging from 100 watts to 600 watts.

3. The etching process of claim 1 wherein said oxygen-bearing gas in said etchant gases is selected from the group consisting of oxygen (02) and carbon dioxide (CO₂) .

4. The etching process of claim 3 wherein said oxygen-bearing gas in said etchant gases consists of oxygen.

5. The etching process of claim 3 wherein said oxygen-bearing gas in said etchant gases consists of carbon dioxide.

6. The etching process of claim 3 wherein said inert carrier gas is present in an amount of up to 50 volume % of the total gases.

8. The etching process of claim 3 wherein said etchant gases are flowed into said vacuum etching chamber at a flow rate equivalent to a total flow rate of from 40 to 100 sccm into a 3 liter vacuum chamber.

9. The etching process of claim 3 wherein the pressure in said vacuum chamber is maintained within a range of from 10 milliTorr to 100 milliTorr.

10. The etching process of claim 3 wherein said cathode wafer support is maintained at a temperature of at least 50°

C.

11. The etching process of claim 3 wherein said wafer is optionally immersed in a magnetic field having a magnetic axis parallel to the plane of the wafer during said etching step.

12. The etching process of claim 11 wherein said optional magnetic field has a field strength of from 0 to 150 gauss.

13. The etching process of claim 3 wherein said chlorine and oxygen-bearing etchant gases have a minimum purity of at least 99.9 volume %.

14. The etching process of claim 13 wherein said chlorine and oxygen-bearing etchant gases have a minimum purity of at least 99.99 volume %.

7. A plasma etching process for etching tungsten silicide using an etchant gas characterized by a high selectivity to both photoresist and silicon oxide which comprises:

a) a) mounting on a wafer support platform in a vacuum etching chamber a semiconductor wafer having an oxide portion, a tungsten silicide portion, and a photoresist portion;

b) flowing into said chamber an etchant gas mixture consisting essentially of chlorine gas and an oxygen-bearing gas; and

c) igniting a plasma in said vacuum etching chamber, between said cathode wafer support and the grounded walls of said vacuum chamber while said etchant gas mixture is flowing through said chamber to etch said tungsten silicide on said wafer.

15. A plasma etching process for etching both tungsten silicide and polysilicon using an etchant gas characterized by a high selectivity to both photoresist and silicon oxide which comprises:

a) mounting on a wafer support platform in a vacuum etching chamber a semiconductor wafer having an oxide portion, a tungsten silicide portion, a polysilicon portion, and a photoresist portion;

b) flowing into said chamber an etchant gas mixture consisting essentially of chlorine gas and an oxygen-bearing gas; and

c) igniting a plasma in said vacuum etching chamber, between said cathode wafer support and the grounded walls of said vacuum chamber while said etchant gas mixture is flowing through said chamber to etch said tungsten silicide and said polysilicon on said wafer.

16. A process for patterning, in a single etch step in a vacuum etch chamber through a photoresist mask, layers of tungsten silicone and polysilicon on an oxide layer on a semiconductor wafer mounted on a cathode in said vacuum chamber, characterized by a high selectivity to both photoresist and silicon oxide, which comprises flowing into said chamber;

a) from 50 to 100 volume % of an etchant gas mixture consisting essentially of chlorine and oxygen-bearing etchant gases in a ratio of from 2 to 20 volume % oxygen-bearing gas to from 80 to 98 volume % chlorine gas; and

b) from 0 to 50 volume % of one or more inert carrier gases;

while maintaining a plasma, between said cathode wafer support and the grounded walls of said vacuum chamber whereby both said tungsten silicide and said polysilicon layers will be etched without damage to said underlying oxide layer and without eroding said photoresist layer sufficiently to damage said tungsten silicide layer beneath said photoresist mask.

17. The etching process of claim 16 wherein said etchant gases are flowed into a vacuum etching chamber at a flow rate equivalent to a total flow rate of from 40 to 100 sccm into a 3 liter vacuum chamber.

18. The etching process of claim 16 wherein the pressure in said vacuum chamber is maintained within a range of from 10 milliTorr to 100 milliTorr.

19. The etching process of claim 16 wherein said cathode wafer support is maintained at a temperature of at least 50°

C.

20. The etching process of claim 16 wherein said wafer is optionally immersed in a magnetic field having a magnetic axis parallel to the plane of the wafer during said etching step and a field strength ranging from 0 to 150 gauss.

21. The etching process of claim 16 wherein said oxygen-bearing etchant gas consists of oxygen (O₂).

22. A process for etching both a layer of tungsten silicide masked with a photoresist mask and an underlying layer of polysilicon which is formed over an oxide layer on a semiconductor wafer mounted on a cathode in a vacuum chamber which comprises:

a) flowing into said chamber, at a rate equivalent to from 40 to 100 sccm into a 3 liter chamber;

i) from 50 to 100 volume % of an etchant gas mixture consisting essentially of chlorine and oxygen-bearing etchant gases in a ratio of from 6 to 10 volume % oxygen-bearing gas and from 90 to 94 volume % chlorine in said etchant gases; and

ii) from 0 to 50 volume percent of one or more inert carrier gases;

b) igniting a plasma, between said cathode wafer support and the grounded walls of said vacuum chamber, and maintaining said plasma at a power level ranging from 100 watts to 600 watts while said etchant gases are flowing into said vacuum chamber;

c) Maintaining said vacuum chamber at a pressure ranging from 10 milliTorr to 100 milliTorr while said etchant gases are flowing into said vacuum chamber;

d) maintaining said cathode wafer support at a temperature of at least 50°

C. while said etchant gases are flowing into said vacuum chamber; and

e) immersing said wafer in a magnetic field having a magnetic axis parallel to the plane of said wafer and a magnetic field strength ranging from 0 to 150 gauss;

to thereby selectively remove said tungsten silicide and said polysilicon without removing said photoresist mask or said underlying oxide layer.

23. The etching process of claim 22 wherein said oxygen-bearing etchant gas consists of oxygen (O₂).