Method of decomposing hydrogen peroxide

• US 5,348,724 A
• Filed: 05/18/1993
• Issued: 09/20/1994
• Est. Priority Date: 06/11/1992
• Status: Expired due to Fees

• Current Assignee: Toshin Chemical Industry Company Limited
• Original Assignee: Toshin Chemical Industry Company Limited
• Inventors: Abe, Yuzuru, Hagimori, Kenji, Kanke, Tetsuo
• Primary Examiner(s): Langel, Wayne
• Application Number:
  US08/064,962
• Time in Patent Office: 490 Days
• Field of Search: 210/928, 210/763, 423/531, 423/579
• US Class Current: 423/531
• CPC Class Codes: C01B 17/90 Separation; Purification
• CPC Class Codes: Y10S 210/928 Paper mill waste, e.g. white water, black liquor treated

Abstract

The improved method achieves effective and economical decomposition of hydrogen peroxide and may be used in recycling hydrogen peroxide containing spent sulfuric acid that has been used in wafer cleaning and other operations in the process of semiconductor fabrication or in removing residual hydrogen peroxide that will occur either within the papermaking process or in plant effluents as a consequence of a shift from chlorine-containing bleaching agents to oxygen-containing bleaching agents.

When coke was added in an amount of 10 wt % to a solution of 0.88 wt % hydrogen peroxide in 72.8 wt % sulfuric acid, followed by treatment at 60°-70° C. for 4 hours, the concentration of hydrogen peroxide dropped to 0.0001 wt % and below. When coke was added in an amount of 10 wt% to each of a solution (pH, 0.94) of 1.0 wt % hydrogen peroxide in 1.1 wt % sulfuric acid and a solution (pH, 2.58) of 1.04 wt % hydrogen peroxide in sulfuric acid followed by treatment at 60°-70° C. for 4 hours, the concentration of hydrogen peroxide dropped to 0.0001 wt % or below and 0.10 wt %, respectively.

Claims

1. A method of completely decomposing residual hydrogen peroxide contained in a waste acid, which comprises contacting waste acid having a pH not higher than 2.6 and which contains hydrogen peroxide, with coke at a temperature in the range from 60°

C. to less than the boiling point of said waste acid, thereby reductively and catalytically decomposing the hydrogen peroxide in said waste acid.

2. The method according to claim 1 wherein said hydrogen peroxide containing waste acid is a waste acid which has been produced, in the process of semiconductor fabrication.

3. A method of decomposing hydrogen peroxide contained in a waste sulfuric acid, which comprises preheating a waste sulfuric acid containing hydrogen peroxide produced in the process of semiconductor fabrication, to a temperature in the range of 60°

C. to less than the boiling point of said waste sulfuric acid, and passing the preheated sulfuric acid through a column or columns each packed with coke to thereby obtain purified sulfuric acid whose content of the remaining hydrogen peroxide is 1 ppm or below.

4. A method of decomposing residual hydrogen peroxide contained in a wastewater, which comprises adjusting the acidity of the wastewater which contains hydrogen peroxide to the pH range of 2.6 or below, and then contacting said wastewater with coke at an elevated temperature, thereby reductively and catalytically decomposing the hydrogen peroxide in said wastewater.

5. A method of decomposing residual hydrogen peroxide contained in a wastewater having pH in the acidic range not higher than 2.6, said wastewater containing hydrogen peroxide, which comprises contacting said wastewater hydrogen peroxide with coke at an elevated temperature in the range from 60°

C. to less than the boiling point of said wastewater thereby reductively and catalytically decomposing the hydrogen peroxide in said wastewater.