Formation of a layer of aluminum and tin or titanium oxides on a glass substrate

• US 5,348,805 A
• Filed: 02/05/1993
• Issued: 09/20/1994
• Est. Priority Date: 07/05/1990
• Status: Expired due to Fees

• Current Assignee: Saint-Gobain Vitrage International
• Original Assignee: Saint-Gobain Vitrage International
• Inventors: Cordier, Bruno, Zagdoun, Georges
• Primary Examiner(s): Robinson, Ellis P.
• Assistant Examiner(s): Speer, Timothy M.
• Application Number:
  US08/014,100
• Time in Patent Office: 592 Days
• Field of Search: 359/359, 359/580, 359/586, 428/432, 428/436, 428/699, 428/697, 428/701, 428/702, 428/210, 428/216, 428/212, 428/437, 428/442, 428/209, 428/425.6
• US Class Current: 428/432
• CPC Class Codes: C03C 17/25 by deposition from the liquid phase
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 2217/23 Mixtures
• CPC Class Codes: C03C 2218/112 by spraying
• CPC Class Codes: Y10T 428/24917 including metal layer
• CPC Class Codes: Y10T 428/24926 including ceramic, glass, porcelain or quartz layer
• CPC Class Codes: Y10T 428/24942 including components having same physical characteristic in differing degree
• CPC Class Codes: Y10T 428/24975 No layer or component greater than 5 mils thick
• CPC Class Codes: Y10T 428/31601 Quartz or glass
• CPC Class Codes: Y10T 428/3163 Next to acetal of polymerized unsaturated alcohol [e.g., formal butyral, etc.]
• CPC Class Codes: Y10T 428/31649 Ester, halide or nitrile of addition polymer

Abstract

A solution of an organic compound of aluminum and tin or titanium is formed from, respectively, a nonhydrolyzable aluminum chelate and at least one organic compound of tin or a titanium chelate or alcoholate. The solution is then sprayed onto a heated glass substrate, thereby thermally decomposing and oxidizing the solution on the heated glass substrate to form, respectively, a layer of aluminum and tin or titanium oxides on the glass substrate. A semiconductive layer can be deposited upon the aluminum/tin or aluminum/titanium layer to form a coated glass structure which is useful for buildings or automobiles.

Claims

1. A coated glass structure for use as a glazing, comprising:

a glass substrate; and

a layer of aluminum oxide and titanium oxide upon at least a portion of said glass substrate and a semiconductive layer upon at least a portion of said layer of aluminum oxide and titanium oxide;

wherein said layer of aluminum oxide and titanium oxide has an index of refraction of between about 1.73 and 1.80, an absorption percentage over the visible spectrum of less than or equal to about 3%, and a thickness between about 40 nm and 150 nm with a thickness variation of less than or equal to about 5%, and wherein said layer of aluminum oxide and titanium oxide is formed on said glass substrate by heating said glass substrate to a temperature less than its softening temperature, forming a solution of a non-hydrolyzable aluminum chelate and at least two heat decomposable titanium compounds to form a solution having a weight ratio of Al;

Ti of not greater than about 2;

1, and spraying said solution onto said heated glass substrate to thermally decompose and oxidize said solution on said heated glass substrate to form a layer of aluminum oxide and titanium oxide on said glass substrate.

2. The structure of claim 1 which further comprises:

a plastic sheet of PVB, PVC, or PU polymer; and

a glass plate having an upper edge and a lower edge, wherein power lead-ins are placed along said upper edge and said lower edge; and

wherein said plastic sheet is inserted in contact with and in between said semiconductive layer and said glass plate to form a heated, laminated glazing.

3. The structure of claim 1 which further comprises a semiconductive layer on said layer of aluminum oxide and titanium oxide.

4. The structure of claim 1, wherein said semiconductive layer is a layer of tin oxide doped with fluorine, a layer of indium oxide doped with tin or a layer of zinc oxide doped with indium or aluminum.

5. The structure of claim 4, wherein said layer of aluminum oxide and titanium oxide has a thickness between about 80 nm and 100 nm and said semiconductive layer has a thickness between about 100 nm and 800 nm;

wherein said layer of aluminum oxide and titanium oxide and said semiconductive layer form a coating structure which is neutral in reflection with a purity in reflection less than or equal to about 10%.

6. The structure of claim 4, wherein said layer of aluminum oxide and titanium oxide has an absorption percentage of less than or equal to about 3%, an index of refraction of about 1.75±

0.01 and a thickness of about 90 nm with a thickness variation less than or equal to about 5%;

said semiconductive layer has a thickness of 360 nm; and

said layer of aluminum oxide and titanium oxide and said semiconductive layer form a coating structure which is neutral in reflection with a purity in reflection of approximately 5%.

7. The structure of claim 3, wherein said layer of aluminum oxide and titanium oxide has an absorption percentage of less than or equal to about 3% and a thickness between about 80 nm and 100 nm with a thickness variation less than or equal to about 5%;

said semiconductive layer is formed of tin oxide doped with fluorine and has a emissivity less than or equal to about 0.27 and a thickness greater than or equal to about 300 nm; and

said aluminum oxide and tin oxide layer, said semiconductive layer and said glass substrate form a low-emissivity glazing, wherein said low-emissivity glazing is neutral in reflection with a purity in reflection less than or equal to about 10%.

8. The structure of claim 5, wherein said layer of aluminum oxide and titanium oxide has an absorption percentage of less than or equal to about 3% and a thickness variation less than or equal to about 5%;

said semiconductive layer has a resistivity of approximately 6×

10^-4 Ω

cm; and

said aluminum oxide and titanium oxide layer, said semiconductive layer and said glass substrate form a heated glazing which is neutral in reflection with a purity in reflection less than or equal to about 10%.

9. The structure of claim 6, which further comprises:

a plastic sheet of PVB, PVC, or PV polymer; and

a glass plate having an upper edge and a lower edge, wherein power lead-ins are placed along said upper edge and said lower edge;

wherein said plastic sheet is inserted in contact with and in between said semiconductive layer and said glass plate to form a heated, laminated glazing.

10. A coated glass structure for use as a glazing, comprising:

a glass substrate; and

a layer of aluminum oxide and titanium oxide upon at least a portion of said glass substrate;

wherein said layer of aluminum oxide and titanium oxide has an index of refraction between about 1.73 to 1.80, an absorption percentage over the visible spectrum of less than or equal to about 3%, and a thickness between about 40 nm to 150 nm with a thickness variation less than or equal to about 5%.

11. A coated glass structure for use as a glazing, comprising:

a glass substrate and a stack of layers on the glass substrate, said stack comprising,

a layer of aluminum oxide and tin oxide upon at least a portion of said glass substrate, said layer having an Al to Sn ratio between 1.15 to 1.40;

a titanium oxide layer formed on said layer of aluminum oxide and tin oxide, and a semiconductive layer upon at least a portion of said layer of aluminum oxide and tin oxide to form a glazing which is neutral in reflection with a purity in reflection less than or equal to about 10%,

wherein said layer of aluminum oxide and tin oxide has an index of refraction between about 1.65 to 1.76, an absorption percentage over the visible spectrum of less than or equal to about 3%, and a thickness between about 40 nm to 150 nm with a thickness variation less than or equal to about 5%, and wherein said layer of aluminum oxide and tin oxide is formed by heating said glass substrate to a temperature less than its softening temperature, forming a solution of a non-hydrolyzable aluminum chelate and tin compounds to form a solution having a weight ratio of Al;

Sn of about 0.10;

1 to 0.70;

1, spraying said solution onto said heated glass substrate to thermally decompose and oxidize said solution on said heated glass substrate to form said layer of aluminum oxide and tin oxide on said glass substrate.

12. The coated glass structure of claim 11 further comprising a silicon oxide layer on said titanium oxide layer.

13. The coated glass structure of claim 12 wherein said titanium oxide layer has an optical thickness of about λ

/2.

14. The coated glass structure of claim 13 wherein said silicon oxide layer has an optical thickness of about λ

/4.