Chemical vapor deposition under a single reactor vessel divided into separate reaction regions with its own depositing and exhausting means
First Claim
1. Apparatus for a sequential continuous vapor deposition process in a plurality of physically separated process environments defined within the apparatus, the apparatus comprising:
- single reactor vessel means for enclosing the process within an interior space thereof at a predetermined environmental pressure,substrate mounting means in the interior space for movably positioning a substrate means mounted thereon sequentially through the plurality of separated process environments,each separated process environment comprising;
gas emission and directing means in the interior space for continuously emitting a predetermined gas from a separate source thereof into the separate process environment, the continuously emitted gas emitted adjacent to the substrate means when the substrate means is moved into the process environment, the gas emission and directing means emitting the gas at a rate sufficient to prevent diffusion of gas from the interior space into said process environment,gas exhaust means structurally located to surround the separate process environment, for continuously exhausting substantially all of the gas emitted by the gas emission and directing means from the separate process environment across a pressure differential into the interior space, the pressure differential sufficient to prevent intermixture of gases by diffusion of gases from the interior space, andevacuation means communicating with the single reactor vessel means for exhausting gas from the interior space to maintain the interior space at the predetermined environmental pressure.
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Abstract
Apparatus for a sequential continuous vapor deposition process provides a plurality of physically separated process environments in a single reactor vessel. A substrate mounting plate within the reactor vessel movably positions a substrate mounted thereon sequentially between the plurality of separated process environments. Each of the process environments are defined by a gas emitter structure for emitting a predetermined gas from a source thereof to the environment adjacent to the substrate when it is moved into position adjacent thereto and an exhaust structure through which the gas flows from the environment. A substrate positioning structure movably positions the substrate mounting plate so that the substrate is thereby sequentially passed through each one of the process environments. A vacuum pump between the chamber and an external exhaust environment produces a negative pressure within the reactor vessel relative to pressures at the plural gas emitters to maintain physical separation of gases flowing within the plurality of separated process environments.
53 Citations
14 Claims
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1. Apparatus for a sequential continuous vapor deposition process in a plurality of physically separated process environments defined within the apparatus, the apparatus comprising:
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single reactor vessel means for enclosing the process within an interior space thereof at a predetermined environmental pressure, substrate mounting means in the interior space for movably positioning a substrate means mounted thereon sequentially through the plurality of separated process environments, each separated process environment comprising; gas emission and directing means in the interior space for continuously emitting a predetermined gas from a separate source thereof into the separate process environment, the continuously emitted gas emitted adjacent to the substrate means when the substrate means is moved into the process environment, the gas emission and directing means emitting the gas at a rate sufficient to prevent diffusion of gas from the interior space into said process environment, gas exhaust means structurally located to surround the separate process environment, for continuously exhausting substantially all of the gas emitted by the gas emission and directing means from the separate process environment across a pressure differential into the interior space, the pressure differential sufficient to prevent intermixture of gases by diffusion of gases from the interior space, and evacuation means communicating with the single reactor vessel means for exhausting gas from the interior space to maintain the interior space at the predetermined environmental pressure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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Specification