Method of forming circuit wiring pattern
First Claim
1. A method of forming a circuit wiring pattern comprising the steps of:
- forming trenches at predetermined positions for defining a circuit wiring pattern, on at least one of the surfaces of an insulating base material, and filling said trenches with a conductive material;
removing said conductive material in such a manner that a conductive layer resulting from said filling exists only in registration with said trenches formed in said insulating base material, and non-conductive gap portions of said circuit wiring pattern comprising said insulating base material intermediate said trenches are exposed; and
forming an insulating surface protection layer over the surface of said circuit wiring pattern.
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Accused Products
Abstract
This invention provides a method of forming a circuit wiring pattern which cannot be formed by a prior art method such as etching or plating. This method comprises a step of forming trenches for forming a circuit wiring pattern at predetermined positions on at least one of the surface of an insulating base material and then filling a conductive material into the trenches, a step of removing conductor layers in such a manner that the conductor layers formed by the step described above exist only in the trenches formed in the insulating base material and gap portions of the circuit wiring pattern comprising the conductor layers formed in the trenches of the insulating base material are exposed, and a step of forming an insulating surface protection layer.
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Citations
21 Claims
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1. A method of forming a circuit wiring pattern comprising the steps of:
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forming trenches at predetermined positions for defining a circuit wiring pattern, on at least one of the surfaces of an insulating base material, and filling said trenches with a conductive material; removing said conductive material in such a manner that a conductive layer resulting from said filling exists only in registration with said trenches formed in said insulating base material, and non-conductive gap portions of said circuit wiring pattern comprising said insulating base material intermediate said trenches are exposed; and forming an insulating surface protection layer over the surface of said circuit wiring pattern. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method of forming a circuit wiring pattern comprising the steps of:
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forming trenches at predetermined positions for defining a circuit wiring pattern on at least one of the surfaces of an insulating base material, and forming a functional film on the surface of said insulating base material including the surfaces of said trenches; filling said trenches with conductive material; removing said conductive material and functional film in such a manner that layers of said conductive material and said functional film remain in said trenches formed in said insulating base material, and non-conductive gap portions of said circuit wiring pattern are exposed intermediate said trenches; and forming an insulating surface protection layer over the surface of said circuit wiring pattern defined by said conductive material in said trenches and said gap portions. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A method of forming a circuit wiring pattern comprising the steps of:
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forming trenches at predetermined positions for defining a circuit wiring pattern on at least one of the surfaces of an insulating base material, and then forming a layer of conductive material on the surface of said insulating base material, said layer of conductive material extending into and filling said trenches; removing said conductive material in such a manner that said conductive layer exists only in said trenches formed in said insulating base material and said insulating base material is exposed in regions displaced from said trenches; and forming an insulating surface protection layer over said remaining conductive layer. - View Dependent Claims (16, 17, 18, 19, 20, 21)
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Specification