Electrode for use in a plasma assisted chemical etching process
First Claim
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1. An electrode for use in a Plasma Assisted Chemical Etching process for etching a figurable substrate, said electrode comprising:
- an outer member having an outside surface bordered by a top surface and a bottom surface, said outer member further having an inside surface thereof which defines a vertically oriented cavity therein, said cavity extending from said top surface to said bottom surface, said inside surface of said outer member having a lower portion thereof;
an inner member having an outside surface bordered by a top surface and a bottom surface, said outside surface of said inner member further having a lower portion thereof, said inner member having a ducting system bored therein which extends from said top surface thereof to said outside surface therethrough;
said inner member nesting within said cavity of said outer member such that said lower portion of said outer member'"'"'s inside surface and said lower portion of said inner member'"'"'s outside surface define a vertically oriented gap therebetween which extends downward to said bottom surfaces of said inner and outer members; and
gas source means for flowing a gas through said ducting system of said inner member and through said gap defined between said inner and outer members and onto said figurable substrate.
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Abstract
The electrode (11) of the present invention is used in a Plasma Assisted Chemical Etching process and comprises an inner member (47) surrounded by an outer member (45) defining a gap (77) therebetween such that a gas can flow therethrough. In the preferred embodiment, the inner member (47) and the concentric outer member (45) are both cylindrical in shape, therefore, the gap (77) has an annular configuration. A vertical ducting system is bored within the inner member (47) and directly or indirectly intersects the annular gap (77).
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Citations
26 Claims
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1. An electrode for use in a Plasma Assisted Chemical Etching process for etching a figurable substrate, said electrode comprising:
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an outer member having an outside surface bordered by a top surface and a bottom surface, said outer member further having an inside surface thereof which defines a vertically oriented cavity therein, said cavity extending from said top surface to said bottom surface, said inside surface of said outer member having a lower portion thereof; an inner member having an outside surface bordered by a top surface and a bottom surface, said outside surface of said inner member further having a lower portion thereof, said inner member having a ducting system bored therein which extends from said top surface thereof to said outside surface therethrough; said inner member nesting within said cavity of said outer member such that said lower portion of said outer member'"'"'s inside surface and said lower portion of said inner member'"'"'s outside surface define a vertically oriented gap therebetween which extends downward to said bottom surfaces of said inner and outer members; and gas source means for flowing a gas through said ducting system of said inner member and through said gap defined between said inner and outer members and onto said figurable substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. An electrode for use in a Plasma Assisted Chemical Etching process for etching a figurable substrate, said electrode comprising:
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an outer member having an outside surface bordered by a substantially flat top surface and a substantially flat bottom surface, said outside surface of said outer member having a cylindrical cross sectional shape thereof with an upper inwardly stepped portion thereabove, said outer member further having a cylindrically-shaped inside surface which defines a vertically oriented cavity therein, said cavity extending from said top surface to said bottom surface, said inside surface of said outer member having a lower portion with an outwardly stepped portion located thereabove; an inner member having a cylindrically-shaped outside surface bordered by a substantially flat top surface and a substantially flat bottom surface, said outside surface of said inner member having a lower portion with an outwardly stepped portion located thereabove, said outwardly stepped portion of said inner member'"'"'s outside surface being attached within said corresponding upper outwardly stepped portion of said outside member'"'"'s inside surface by an interference press fit, said outwardly stepped portion of said inner member being juxtapositioned above said annular gap and enclosing the top thereof, said inner member further having a duct vertically extending therein from said top surface to at least one passage located therethrough, said passage being positioned transversely between said top and bottom surfaces of said inner member and extending radially outward from said duct to said outside surface of said inner member; said inner member fitting concentrically within said cavity of said outer member such that said lower portion of said outer member'"'"'s inside surface and said lower portion of said inner member'"'"'s outside surface define a vertically oriented annular gap therebetween which extends downward to said bottom surfaces of said inner and outer members, said top and bottom surfaces of said outer member and said top and bottom surfaces of said inner member being substantially coplanar to one another, said bottom surface of said outer member, said bottom surface of said inner member and said gap defined therebetween being directed toward a top surface of said figurable substrate; and a gas source means for flowing a gas through said duct and said passage of said inner member and through said gap defined between said inner and outer members and onto said figurable substrate.
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14. A method for using an electrode used in a Plasma Assisted Chemical Etching process to etch a figurable substrate, said method comprising:
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(a) creating a ducting system within an inner member, said inner member having an outside surface with a lower portion thereof; (b) creating a vertically oriented cavity centrally within an outer member, said cavity being defined by an inside surface of said outer member, said inside surface having a lower portion thereof; (c) fitting said inner member within said cavity of said outer member such that said lower portion of said inner member'"'"'s outside surface and said lower portion of said outer member'"'"'s inside surface define a gap therebetween; (d) mounting a figurable substrate below said bottom surfaces of said inner and outer members; and (e) flowing a gas through said ducting system of said inner member and through said gap defined between said inner and outer members and onto said figurable substrate. - View Dependent Claims (15, 16, 17, 18, 19, 20)
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21. An improved electrode for use in a plasma assisted chemical etching process for etching a figurable substrate, the improvement comprising:
a magnesium electrode member. - View Dependent Claims (25)
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22. A method of etching a figurable substrate, the method including the steps of:
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providing a gas plasma; providing a magnesium electrode member; and flowing said gas plasma through said electrode member onto said substrate to etch said figurable substrate.
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23. An improved system of the type using an electrode and a plasma gas for etching a figurable substrate, the improvement comprising:
an electrode member made of a material selected to interact with said plasma gas to enhance the useful life of the electrode. - View Dependent Claims (24)
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26. A method of etching a figurable substrate, said method including the steps of:
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providing a gas plasma; providing an electrode member made of a material which becomes passivated by said gas plasma to increase the durability of said electrode; and flowing said gas through said electrode to etch said figurable substrate.
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Specification