Durable low-emissivity solar control thin film coating
First Claim
1. A thin film interference filter having a substantially neutral visible reflected color, comprising:
- a transparent substrate;
a first substantially transparent dielectric layer having a refractive index within a range of approximately 2.0 and 2.7;
a first metal precoat layer;
a partially reflective metal layer;
a second metal precoat layer; and
a second substantially transparent dielectric layer comprising silicon nitride.
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Accused Products
Abstract
An infrared reflecting interference filter capable of transmitting a desired proportion of visible radiation while reflecting a large portion of incident solar radiation is provided. The filter consists of a transparent substrate coated first with a dielectric layer, next a partially metal reflectance layer, and finally an outer protective dielectric layer. In addition, between each metal-dielectric interface is deposited a nucleation or glue layer that facilitates adhesions and improves chemical and mechanical resistance. The interference filters are durable and can be modified to provide a full range of optical and electrical characteristics. The dielectric layer can comprise of composite films consisting of silicon nitride in combination with zirconium nitride, titanium nitride, and/or hafnium nitride.
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Citations
25 Claims
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1. A thin film interference filter having a substantially neutral visible reflected color, comprising:
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a transparent substrate; a first substantially transparent dielectric layer having a refractive index within a range of approximately 2.0 and 2.7; a first metal precoat layer; a partially reflective metal layer; a second metal precoat layer; and a second substantially transparent dielectric layer comprising silicon nitride. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A method for the production of a durable thin film interference filter on a transparent substrate, with said filter having a substantially neutral visible reflected color, comprising the steps, in sequence, of:
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reactively sputtering a first substantially transparent dielectric layer having a refractive index within a range of approximately 2.0 to 2.7 onto said substrate; depositing a first metal precoat layer; depositing a partially reflective metal layer; depositing a second metal precoat layer; and reactively sputtering a second substantially transparent protective dielectric layer comprising silicon nitride onto said second metal precoat layer, which comprises the steps of; (a) providing a cylindrical magnetron having a silicon coated rotatable target and having magnetic means disposed at an angle of approximately 30°
to 80°
from normal relative to said substrate; and(b) moving said substrate towards the rotatable target so that dielectric material reactively sputtered is focused onto the substrate at an acute angle as the substrate approaches the target in order to reduce the intrinsic stress of the second dielectric layer that is formed. - View Dependent Claims (18, 19, 20)
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21. A method for the production of a durable thin film interference filter on a transparent substrate, with said filter having a substantially neutral visible reflected color, comprising the steps, in sequence, of:
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reactively sputtering a first substantially transparent dielectric layer having a refractive index within a range of approximately 2.0 to 2.7 onto said substrate, wherein said first dielectric layer comprises a composite of silicon nitride and one or more other nitrides selected from the group consisting of zirconium nitride, titanium nitride, and hafnium nitride, wherein said first dielectric layer comprises of approximately 60 to 95% by weight of silicon nitride onto said substrate; depositing a first metal precoat layer; depositing a partially reflective metal layer; depositing a second metal precoat layer; and reactively sputtering a second substantially transparent protective dielectric layer onto said second metal precoat layer. - View Dependent Claims (22, 23)
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24. A method for the production of a durable thin film interference filter on a transparent substrate, with said filter having a substantially neutral visible reflected color, comprising the steps, in sequence, of:
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reactively sputtering a first substantially transparent dielectric layer having a refractive index within a range of approximately 2.0 to 2.7 onto said substrate; depositing a first metal precoat layer; depositing a partially reflective metal layer; depositing a second metal precoat layer; and reactively sputtering a second substantially transparent protective dielectric layer onto said metal precoat layer wherein said second dielectric layer is a composite comprising of silicon nitride and one or more other nitrides selected from the group consisting of zirconium nitride, titanium nitride, and hafnium nitride, and wherein said second dielectric layer comprises of approximately 60 to 95% by weight of silicon nitride. - View Dependent Claims (25)
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Specification