Process for removing gaseous hydrides from a solid support comprising metallic oxides
First Claim
1. Process for removing gaseous inorganic hydrides from a gas stream, comprising circulating a gas flow containing the hydrides diluted in an inert gas, on a solid support consisting essentially of metallic oxides of manganese, copper and chromium, and having a specific area lower than or equal to 100 m2 /g, said solid support having from 2.5 to 5 weight % Mn, 25 to 70 weight % Cu, and 15 to 40 weight % Cr, and wherein said hydrides are selected from the group consisting of silanes, phosphine, diborane, germane, stannane, gallane, hydrogen telluride and hydrogen selenide.
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Abstract
The invention concerns a process for removing gaseous hydrides from a solid support of metallic oxides, which consists in causing a gas flow to circulate, at room temperature, on a solid support comprising at least copper and chromium and having a specific area lower than or equal to 100 m2 /g. This process may be used for the destruction of gaseous hydrides from the industry of semi-conductors, for example silanes, arsine, phosphine, diborane, germane, stannane, gallane, stibine, and hydrogen telluride, selenide and sulfide.
25 Citations
21 Claims
- 1. Process for removing gaseous inorganic hydrides from a gas stream, comprising circulating a gas flow containing the hydrides diluted in an inert gas, on a solid support consisting essentially of metallic oxides of manganese, copper and chromium, and having a specific area lower than or equal to 100 m2 /g, said solid support having from 2.5 to 5 weight % Mn, 25 to 70 weight % Cu, and 15 to 40 weight % Cr, and wherein said hydrides are selected from the group consisting of silanes, phosphine, diborane, germane, stannane, gallane, hydrogen telluride and hydrogen selenide.
- 7. Process for removing gaseous inorganic hydrides from a gas stream, comprising circulating a gas flow containing from 2.5 to 10 volume % of the hydrides diluted in an inert gas, on a solid support consisting essentially of metallic oxides of copper, chromium, barium and manganese said manganese being present in an amount from 2.5 to 5 weight %, and having a specific area lower than or equal to 100 m2 /g.
- 16. Process for removing gaseous inorganic hydrides from a gas stream, comprising circulating a gas flow containing from 1 to 10 volume % of the hydrides diluted in an inert gas, on a solid support consisting essentially of metallic oxides of copper, chromium, barium and manganese said manganese being present in an amount from 2.5 to 5 weight %, and having a specific area lower than or equal to 100 m2 /g, said hydrides being selected from the group consisting of silanes, phosphine, diborane, germane, stannane, gallane, hydrogen telluride and hydrogen selenide.
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21. Process for removing gaseous inorganic hydrides from a gas stream, comprising circulating a gas flow containing the hydrides diluted in an inert gas, on a solid support consisting essentially of metallic oxides of manganese, copper, chromium, and barium, and having a specific area lower than or equal to 100 m2 /g, said solid support having from 2.5 to 5 weight % Mn, 25 to 70 weight % Cu, and 14 to 40 weight % Cr, and wherein said hydrides are selected from the group consisting of silanes, phosphine, diborane, germane, stannane, gallane, hydrogen telluride and hydrogen selenide.
Specification