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Formation of microstructures using a preformed photoresist sheet

  • US 5,378,583 A
  • Filed: 05/24/1993
  • Issued: 01/03/1995
  • Est. Priority Date: 12/22/1992
  • Status: Expired due to Term
First Claim
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1. A method of forming microstructures comprising the steps of:

  • (a) providing a preformed sheet of photoresist material which can be exposed to radiation to affect its susceptibility to a developer;

    (b) exposing the photoresist sheet in a pattern to radiation which will change its susceptibility to a developer;

    (c) mechanically removing the material of the photoresist sheet to reduce the thickness of the sheet to a desired thickness; and

    (d) applying a developer to the exposed photoresist to remove photoresist which is susceptible to the developer.

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